diphenyliodonium pyrenesulfonate | 137308-87-3

• 分子结构分类: 有机化合物 - 苯类化合物 - 芘
• 英文名称: diphenyliodonium pyrenesulfonate
• 英文别名: diphenyliodanium;pyrene-1-sulfonate
• CAS: 137308-87-3
• 化学式: C₁₂H₁₀I*C₁₆H₉O₃S
• 分子量: 562.428
• InChiKey: OVAZMTZNAIEREQ-UHFFFAOYSA-M

计算性质

• 辛醇/水分配系数(LogP)：
  3.3
• 重原子数：
  33
• 可旋转键数：
  2
• 环数：
  6.0
• sp3杂化的碳原子比例：
  0.0
• 拓扑面积：
  65.6
• 氢给体数：
  0
• 氢受体数：
  3

反应信息

• 作为反应物：
  描述：

  、 、 Iodonium 、 sulphonium 、 鏻 、 oxonium 、 二苯基碘三氟甲烷磺酸盐 、 diphenyliodonium pyrenesulfonate 、 Diphenyliodonium dodecylbenzenesulfonate 、 三苯基锍与三氟甲磺酸的盐 、 (4-叔-丁基苯基)二苯基锍三氟甲磺酸 以), 4-methoxyphenyldiphenylsulfonium triflate (trade name “WPAG-370” produced by Wako Pure Chemical Industries, Ltd的产率得到二苯基(4-甲氧基苯基)三氟化硫
  参考文献：
  名称：

  FIELD EFFECT TRANSISTOR

  摘要：

  提供了一种场效应晶体管，包括栅绝缘层、栅电极、半导体层、源极电极和漏极电极。栅绝缘层包含一种含有硅碳键的有机化合物和一种含有金属原子和氧原子之间键的金属化合物；金属原子在栅绝缘层中的含量为100份碳原子和硅原子的总重量中的10至180份重量。该场效应晶体管具有高迁移率和低阈值电压，同时抑制泄漏电流。

  公开号：

  US20160035457A1

文献信息

• [EN] LATENT ACIDS AND THEIR USE<br/>[FR] ACIDES LATENTS ET LEUR UTILISATION
  申请人：BASF SE

  公开号：WO2016124493A1

  公开（公告）日：2016-08-11

  Compounds of the formula (I) and (IA) wherein X is -O(CO)-; R1 is C1-C12haloalkyl or C6-C10haloaryl; R2 is located in position 7 of the coumarinyl ring and is OR8; R2a, R2b and R2C independently of each other are hydrogen; R3 is C1-C8haloalkyl or C1-C8haloalkyl; R4 is hydrogen; and R8 is C1-C6alkyI; are suitable as photosensitive acid donors in the preparation of photoresist compositions such as used for example in the preparation of spacers, insulating layers, interlayer dielectric films, insulation layers, planarization layers, protecting layers, overcoat layers, banks for electroluminescence displays and liquid crystal displays (LCD).

  化合物的化学式（I）和（IA），其中X为-O(CO)-；R1为C1-C12卤代烷基或C6-C10卤代芳基；R2位于香豆素环的第7位，为OR8；R2a、R2b和R2C彼此独立地为氢；R3为C1-C8卤代烷基或C1-C8卤代烷基；R4为氢；R8为C1-C6烷基，适用于作为感光酸给体，用于制备光刻胶组合物，例如用于制备间隔层、绝缘层、层间介质膜、绝缘层、平坦化层、保护层、覆盖层、电致发光显示器和液晶显示器（LCD）的制备。
• Novel carbazole derivative and chemically amplified radiation-sensitive resin composition
  申请人：——

  公开号：US20020172885A1

  公开（公告）日：2002-11-21

  A carbazole derivative of the following formula (1), 1 wherein R 1 and R 2 individually represent a hydrogen atom or a monovalent organic group, or R 1 and R 2 form, together with the carbon atom to which R 1 and R 2 bond, a divalent organic group having a 3-8 member carbocyclic structure or a 3-8 member heterocyclic structure, and R 3 represents a hydrogen atom or a monovalent organic group. The carbazole derivative is suitable as an additive for increasing sensitivity of a chemically amplified resist. A chemically amplified radiation-sensitive resin composition, useful as a chemically amplified resist, comprising the carbazole derivative is also disclosed.

  以下是该段文字的中文翻译： 一种具有以下式（1）的咔唑衍生物，其中R1和R2分别代表氢原子或一价有机基团，或者R1和R2与其结合的碳原子一起形成具有3-8个成员碳环结构或3-8个成员杂环结构的二价有机基团，R3代表氢原子或一价有机基团。该咔唑衍生物适用作为增加化学增感抗蚀性的添加剂。还公开了一种化学增感辐射敏感树脂组合物，该组合物用作化学增感抗蚀剂，包括该咔唑衍生物。
• Novel anthracene derivative and radiation-sensitive resin composition
  申请人：——

  公开号：US20030194634A1

  公开（公告）日：2003-10-16

  A novel anthracene derivative useful as an additive to a radiation-sensitive resin composition is disclosed. The anthracene derivative has the following formula (1), 1 wherein R 1 groups individually represent a hydroxyl group or a monovalent organic group having 1-20 carbon atoms, n is an integer of 0-9, X is a single bond or a divalent organic group having 1-12 carbon atoms, and R 2 represents a monovalent acid-dissociable group. The radiation-sensitive resin composition comprises the anthracene derivative of the formula (1), a resin insoluble or scarcely soluble in alkali, but becomes alkali soluble in the presence of an acid, and a photoacid generator. The composition is useful as a chemically-amplified resist for microfabrication utilizing deep ultraviolet rays, typified by a KrF excimer laser and ArF excimer laser.

  揭示了一种作为辐射敏感树脂组合物添加剂有用的新型蒽衍生物。该蒽衍生物具有以下化学式（1），其中R1基分别表示一个羟基或具有1-20个碳原子的一价有机基团，n是0-9的整数，X是一个单键或具有1-12个碳原子的二价有机基团，R2表示一价酸可解离基团。辐射敏感树脂组合物包括化学式（1）的蒽衍生物，一种在碱性条件下不溶或几乎不溶但在存在酸时变为碱溶的树脂，以及光酸发生剂。该组合物可用作化学放大光刻胶，用于利用KrF准分子激光和ArF准分子激光等深紫外线进行微加工。
• [EN] SULFONIUM DERIVATIVES AND THE USE THEROF AS LATENT ACIDS<br/>[FR] DÉRIVÉS DE SULFONIUM ET LEUR UTILISATION EN TANT QU'ACIDES LATENTS
  申请人：BASF SE

  公开号：WO2010046240A1

  公开（公告）日：2010-04-29

  Compounds of the formula (I), wherein Ar1 is for example phenylene or biphenylene both unsubstituted or substituted; Ar2 and Ar3 are for example independently of each other phenyl, naphthyl, biphenylylyl or heteroaryl, all optionally substituted; or Ar1 and Ar2 for example together with a direct bond, O, S or (CO), form a fused ring system; R is for example hydrogen, C3-C30cycloalkyl or C1-C18alkyl; and R1, R2 and R3 independently of each other are for example C1-C10haloalkyl; are effective photoacid generators (PAG).

  化合物的公式（I），其中Ar1例如是未取代或取代的苯基或联苯基; Ar2和Ar3例如是独立的苯基，萘基，联苯基或杂环基，均可选取代; 或者例如Ar1和Ar2与直接键，O，S或（CO）一起形成融合的环系统; R例如是氢，C3-C30环烷基或C1-C18烷基; R1，R2和R3独立地例如是C1-C10卤代烷基; 是有效的光酸发生剂（PAG）。
• BICYCLOHEXANE DERIVATIVE AND PRODUCTION METHOD FOR SAME
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：EP2524907A1

  公开（公告）日：2012-11-21

  A bicyclohexane derivative compound useful in the field of photoresist, the field of intermediate of drugs and pesticides, and the like, and a manufacturing method of the same are provided. A bicyclohexane derivative compound represented by the following general formula (II) is provided. (In formula (II), Y independently represents an alkyl group of 1 to 10 carbons, a halogen atom, an acyloxy group, an alkoxycarbonyl group or a hydroxyl group, X1 represents a halogen atom, m represents an integer of 0 to 11, and m' represents an integer of 0 to 10.)

  提供了一种在光刻胶领域、药物和杀虫剂的中间体领域等领域中有用的一种萜环己烷衍生物化合物，以及其制备方法。提供了由下述通用公式（II）表示的一种萜环己烷衍生物化合物。（在公式（II）中，Y独立表示1至10个碳原子的烷基、卤素原子、酰氧基、烷氧羰基或羟基，X1表示卤素原子，m表示0至11的整数，m'表示0至10的整数。）