2-methylbenzene-1,3,5-tricarboxaldehyde | 110452-35-2

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: 2-methylbenzene-1,3,5-tricarboxaldehyde
• 英文别名: methylbenzene-2,4,6-tricarboxaldehyde；2-Methylbenzene-1,3,5-tricarbaldehyde
• CAS: 110452-35-2
• 化学式: C₁₀H₈O₃
• 分子量: 176.172
• InChiKey: LEWBYTGHGQINCW-UHFFFAOYSA-N

物化性质

• 熔点：
  138-140 °C
• 沸点：
  344.6±42.0 °C(Predicted)
• 密度：
  1.252±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  0.7
• 重原子数：
  13
• 可旋转键数：
  3
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.1
• 拓扑面积：
  51.2
• 氢给体数：
  0
• 氢受体数：
  3

反应信息

• 作为产物：
  描述：

  4-methylcyclohexa-2,5-diene-1-carboxylic acid 、 N,N-二甲基甲酰胺 在 三氯氧磷 作用下， 生成 2-methylbenzene-1,3,5-tricarboxaldehyde
  参考文献：
  名称：

  Conversion of 1,4-Dihydrobenzoic Acids to Polyformylbenzenes under Vilsmeier Reaction Conditions

  摘要：

  1,4-二氢苯甲酸1a-e在维尔斯迈尔反应条件下通过一步反应转化为苯单、双和三羧醛，得率范围为6%到65%。相同的方法也可以从1,4-二氢-1-萘酸（1f）中获得萘-1,3-二羧醛（2f），得率为91%。

  DOI：

  10.1055/s-1987-27890

文献信息

• Optimized liquid-phase oxidation
  申请人：Wonders George Alan

  公开号：US20060047145A1

  公开（公告）日：2006-03-02

  Disclosed is an optimized process and apparatus for more efficiently and economically carrying out the liquid-phase oxidation of an oxidizable compound. Such liquid-phase oxidation is carried out in a bubble column reactor that provides for a highly efficient reaction at relatively low temperatures. When the oxidized compound is para-xylene and the product from the oxidation reaction is crude terephthalic acid (CTA), such CTA product can be purified and separated by more economical techniques than could be employed if the CTA were formed by a conventional high-temperature oxidation process.

  公开了一种优化的工艺和装置，用于更有效和经济地进行可氧化化合物的液相氧化。这种液相氧化是在气泡柱反应器中进行的，可以在相对较低的温度下提供高效的反应。当被氧化的化合物是对二甲苯，氧化反应的产物是粗对苯二甲酸（CTA）时，这种CTA产物可以通过比传统高温氧化工艺更经济的技术进行纯化和分离。
• Compound for Resist and Radiation-Sensitive Composition
  申请人：Echigo Masatoshi

  公开号：US20080113294A1

  公开（公告）日：2008-05-15

  A radiation-sensitive composition containing 1 to 80% by weight of a solid component and 20 to 99% by weight of a solvent. The solid component contains a compound B which has (a) a structure derived from a polyphenol compound A by introducing an acid-dissociating group to at least one phenolic hydroxyl group of the polyphenol compound A which is synthesized by a condensation between a di- to tetrafunctional aromatic ketone or aromatic aldehyde each having 5 to 36 carbon atoms with a compound having 1 to 3 phenolic hydroxyl groups and 6 to 15 carbon atoms, and (b) a molecular weight of 400 to 2000. The composition containing the compound B is useful as an acid-amplified, non-polymeric resist material, because it is highly sensitive to radiation such as KrF excimer lasers, extreme ultraviolet rays, electron beams, and X-rays, and provides resist patterns with a high resolution, high heat resistance, and high etching resistance.

  一种辐射敏感的组合物，包含1至80重量％的固体组分和20至99重量％的溶剂。固体组分包含化合物B，其具有（a）通过向多酚化合物A的至少一个酚羟基引入酸解离基而导出的结构，多酚化合物A通过二元至四元芳香酮或芳香醛的缩合反应，每个具有5至36个碳原子的化合物与具有1至3个酚羟基和6至15个碳原子的化合物结合，并且（b）分子量为400至2000。含有化合物B的组合物非常敏感于辐射，例如KrF准分子激光器，极紫外线，电子束和X射线，并且提供具有高分辨率，高耐热性和高蚀刻抗性的抗阻图案，因此可用作酸放大的非聚合物抗阻材料。
• COMPOUND FOR RESIST AND RADIATION-SENSITIVE COMPOSITION
  申请人：ECHIGO Masatoshi

  公开号：US20110165516A1

  公开（公告）日：2011-07-07

  A radiation-sensitive composition containing 1 to 80% by weight of a solid component and 20 to 99% by weight of a solvent. The solid component contains a compound B which has (a) a structure derived from a polyphenol compound A by introducing an acid-dissociating group to at least one phenolic hydroxyl group of the polyphenol compound A which is synthesized by a condensation between a di- to tetrafunctional aromatic ketone or aromatic aldehyde each having 5 to 36 carbon atoms with a compound having 1 to 3 phenolic hydroxyl groups and 6 to 15 carbon atoms, and (b) a molecular weight of 400 to 2000. The composition containing the compound B is useful as an acid-amplified, non-polymeric resist material, because it is highly sensitive to radiation such as KrF excimer lasers, extreme ultraviolet rays, electron beams, and X-rays, and provides resist patterns with a high resolution, high heat resistance, and high etching resistance.

  一种辐射敏感组合物，含有1-80重量％的固体组分和20-99重量％的溶剂。固体组分包含化合物B，其具有（a）从多酚化合物A导出的结构，通过在多酚化合物A的至少一个酚羟基上引入酸解离基团而合成，多酚化合物A是由具有5至36个碳原子的二元至四元芳香酮或芳香醛与具有1至3个酚羟基和6至15个碳原子的化合物之间的缩合反应合成的；（b）分子量为400至2000。含有化合物B的组合物可用作酸放大，非聚合物抗蚀材料，因为它对KrF准分子激光、极紫外线、电子束和X射线等辐射非常敏感，并提供具有高分辨率、高耐热性和高蚀刻抗性的抗蚀图案。
• Esterification of an exchange solvent enriched composition
  申请人：Parker Randolph Kenny

  公开号：US20060264664A1

  公开（公告）日：2006-11-23

  A process is provided for producing an enriched carboxylic acid compositions produced by contacting composition comprising a carboxylic acid with an enrichment feed in an enrichment zone to form an enriched carboxylic acid composition. This invention also relates to a process and the resulting compositions for removing catalyst from a carboxylic acid composition to produce a post catalyst removal composition.

  提供一种生产富集羧酸组分的方法，包括将含有羧酸的组分与富集进料在富集区接触，以形成富集羧酸组分。本发明还涉及一种方法和由此产生的组分，用于从羧酸组分中去除催化剂，以生产催化剂去除后的组分。
• Enriched terephthalic acid composition
  申请人：Gibson Edward Philip

  公开号：US20060264666A1

  公开（公告）日：2006-11-23

  A process is provided for producing an enriched carboxylic acid compositions produced by contacting composition comprising a carboxylic acid with an enrichment feed in an enrichment zone to form an enriched carboxylic acid composition. This invention also relates to a process and the resulting compositions for removing catalyst from a carboxylic acid composition to produce a post catalyst removal composition.

  本发明提供了一种生产富集羧酸组分的方法，该方法通过将含有羧酸的组分与富集进料在富集区接触，形成富集羧酸组分。本发明还涉及一种从羧酸组分中去除催化剂以生产后催化剂去除组分的方法和产生的组分。