1-(4-methylphenyl)ethyl 2-methyl-3-oxobutyrate | 167226-13-3

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: 1-(4-methylphenyl)ethyl 2-methyl-3-oxobutyrate
• 英文别名: 1-p-tolylethyl 2-methyl-3-oxobutanoate；1-(4-Methylphenyl)ethyl 2-methyl-3-oxobutanoate
• CAS: 167226-13-3
• 化学式: C₁₄H₁₈O₃
• 分子量: 234.295
• InChiKey: YFVOKZGPRBAZIM-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.8
• 重原子数：
  17
• 可旋转键数：
  5
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.43
• 拓扑面积：
  43.4
• 氢给体数：
  0
• 氢受体数：
  3

反应信息

• 作为反应物：
  描述：

  1-(4-methylphenyl)ethyl 2-methyl-3-oxobutyrate 在 buffer Mopso 、 YKER-I 、 还原型辅酶II(NADPH)四钠盐 作用下， 以 水 为溶剂， 以40%的产率得到1-(4-methylphenyl)ethyl 3-hydroxy-2-methylbutyrate
  参考文献：
  名称：

  Reduction of β-Keto Esters with a Reductase: Construction of Plural Stereocenters Remote from the Reaction Center

  摘要：

  The reduction of sec-alkyl 2-methyl-3-oxobutyrate with a keto ester reductase from bakers' yeast (YKER-I) is accompanied by simultaneous dynamic and static resolution of chiral centers affording the corresponding (2R,3S,1'R)-hydroxy esters preferentially Thus, the enzyme discriminates three chiral centers simultaneously in high stereoselectivity producing useful chiral building blocks. To study the effect of the alcohol moiety which is located at a remote position from the reaction center, upon the interaction between the enzyme and a substrate, steady-state kinetic parameters, K-m and k(cat), of YKER-I for each (1'R)- and (1'S)-substrate have been determined. The results reveal that the stereochemistry at the alcohol moiety affects K-m rather than k(cat). (C) 1999 Academic Press.

  DOI：

  10.1006/bioo.1998.1106
• 作为产物：
  描述：

  1-p-tolylethyl 3-oxobutanoate 、 碘甲烷 在 sodium hydride 作用下， 以 四氢呋喃 为溶剂， 反应 7.0h， 生成 1-(4-methylphenyl)ethyl 2-methyl-3-oxobutyrate
  参考文献：
  名称：

  EP2177506

  摘要：

  公开号：

文献信息

• Introduction of plural asymmetric centers by a β-keto ester reductase from baker's yeast
  作者：Yasushi Kawai、Kouichi Hida、Kaoru Nakamura、Atsuyoshi Ohno

  DOI：10.1016/0040-4039(94)02260-i

  日期：1995.1

  A β-keto ester reductase from baker's yeast catalyzes asymmetric reduction accompanied by simultaneous kinetic resolution of dynamic and dtatic optically active centers. The reduction of 1′-arylethyl 2-methyl-3-oxobutanoates mediated by this enzyme affords the corresponding (1′R)-1′-arylethyl(2R,3S)-3-hydroxy-2-methylbutanoates with excellent stereoselectivity.

  面包酵母中的β-酮酯还原酶催化不对称还原，并同时动态拆分动态和dtatic光学活性中心。的1'-芳基乙基2-甲基-3- oxobutanoates由该酶介导的还原，得到相应的（1' - [R）-1'-芳基乙基（2 - [R，3小号）-3-羟基-2- methylbutanoates具有优异的立体选择性。
• POSITIVE RESIST COMPOSITION, PATTERN FORMING METHOD USING THE COMPOSITION, AND COMPOUND FOR USE IN THE COMPOSITION
  申请人：Takahashi Hidenori

  公开号：US20110183258A1

  公开（公告）日：2011-07-28

  A positive resist composition comprising (A) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, (B) a resin capable of increasing the solubility in an alkali developer by the action of an acid, and (C) a compound having a specific structure, which decomposes by the action of an acid to generate an acid, a pattern forming method using the positive resist composition, and a compound for use in the positive resist composition are provided as a positive resist composition exhibiting good performance in terms of pattern profile, line edge roughness, pattern collapse, sensitivity and resolution in normal exposure (dry exposure), immersion exposure and double exposure, a pattern forming method using the positive resist composition and a compound for use in the positive resist composition.

  本发明提供了一种正性光阻组合物，包括（A）一种在与光致发色剂或辐射照射时能够产生酸的化合物，（B）一种树脂，能够通过酸的作用增加在碱性显影剂中的溶解度，以及（C）一种具有特定结构的化合物，能够通过酸的作用分解产生酸。该正性光阻组合物在正常曝光（干曝光）、浸没曝光和双重曝光中表现出良好的图案形貌、线边粗糙度、图案坍塌、灵敏度和分辨率性能。同时，本发明提供了一种使用该正性光阻组合物的图案形成方法以及用于该正性光阻组合物的化合物。
• POSITIVE RESIST COMPOSITION, PATTERN FORMING METHOD USING THE COMPOSITION, AND COMPOUND USED IN THE COMPOSITION
  申请人：Fujifilm Corporation

  公开号：EP2177506A1

  公开（公告）日：2010-04-21

  A positive resist composition comprising (A) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, (B) a resin capable of increasing the solubility in an alkali developer by the action of an acid, and (C) a compound having a specific structure, which decomposes by the action of an acid to generate an acid, a pattern forming method using the positive resist composition, and a compound for use in the positive resist composition are provided as a positive resist composition exhibiting good performance in terms of pattern profile, line edge roughness, pattern collapse, sensitivity and resolution in normal exposure (dry exposure), immersion exposure and double exposure, a pattern forming method using the positive resist composition and a compound for use in the positive resist composition.

  一种正向抗蚀剂组合物，包括(A)一种在光射线或辐射照射下能生成酸的化合物；(B)一种在酸的作用下能增加在碱显影剂中的溶解度的树脂；(C)一种具有特定结构的化合物，该化合物在酸的作用下分解生成酸；一种使用该正向抗蚀剂组合物的图案形成方法、本发明提供了一种正抗蚀剂组合物，在正常曝光（干法曝光）、浸泡曝光和双重曝光时，在图案轮廓、线缘粗糙度、图案塌陷、灵敏度和分辨率方面表现出良好的性能；还提供了一种使用该正抗蚀剂组合物的图案形成方法和一种用于该正抗蚀剂组合物的化合物。
• Positive resist composition and pattern forming method using the composition
  申请人：Fujifilm Corporation

  公开号：EP2450746A1

  公开（公告）日：2012-05-09

  A positive resist composition comprising (A) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, (B) a resin capable of increasing the solubility in an alkali developer by the action of an acid, the resin (B) containing a hydroxystyrene-based repeating unit and a repeating unit having an acid decomposable group; and (C) a compound having a specific structure, which decomposes by the action of an acid to generate and acid, and a pattern forming method using the positive resist composition, are provided as a positive resist composition exhibiting good performance in terms of pattern profile, line edge roughness, pattern collapse, sensitivity and resolution in normal exposure (dry exposure), immersion exposure and double exposure, a pattern forming method using the positive resist composition.

  本发明提供了一种正抗蚀剂组合物，该组合物由以下部分组成：(A)一种化合物，该化合物在接受放 射线或辐射照射时能够生成一种酸；(B)一种树脂，该树脂能够在酸的作用下增加在碱显影剂中的溶解度，该树脂(B)含有羟基苯乙烯基重复单元和具有可被酸分解的基团的重复单元；和 (C) 具有特定结构的化合物，该化合物在酸的作用下分解生成和酸，并提供了使用该正抗蚀剂组合物的图案形成方法，该正抗蚀剂组合物在正常曝光（干法曝光）、浸渍曝光和双重曝光时，在图案轮廓、线边缘粗糙度、图案塌陷、灵敏度和分辨率方面表现出良好的性能。
• US8507174B2
  申请人：——

  公开号：US8507174B2

  公开（公告）日：2013-08-13