(4-hydroxyphenyl)(3,4,5-trihydroxyphenyl)methanone | 124207-34-7

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: (4-hydroxyphenyl)(3,4,5-trihydroxyphenyl)methanone
• 英文别名: (4-Hydroxyphenyl)-(3,4,5-trihydroxyphenyl)methanone
• CAS: 124207-34-7
• 化学式: C₁₃H₁₀O₅
• 分子量: 246.219
• InChiKey: FAJQYAWNHOEHRM-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.8
• 重原子数：
  18
• 可旋转键数：
  2
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.0
• 拓扑面积：
  98
• 氢给体数：
  4
• 氢受体数：
  5

反应信息

• 作为产物：
  描述：

  没食子酸 、 苯酚 在 甲烷磺酸 作用下， 以55 %的产率得到(4-hydroxyphenyl)(3,4,5-trihydroxyphenyl)methanone
  参考文献：
  名称：

  [EN] PROCESS FOR PREPARING ACYL DERIVATIVES
  [FR] PROCÉDÉ DE PRÉPARATION DE DÉRIVÉS D'ACYLE

  摘要：

  The present invention relates to a process for preparing aromatic acyl derivatives of formula (I) using methanesulfonic acid. The invention further relates to methods for preparing biological active ingredients, such as paracetamol.

  公开号：

  WO2023073080A1

文献信息

• Evaluation of Polyhydroxybenzophenones as α-Glucosidase Inhibitors
  作者：Xuesen Hu、Yang Xiao、Jianlong Wu、Lin Ma

  DOI：10.1002/ardp.201000147

  日期：2011.2

  This experiment was designed to synthesize 18 kinds of polyhydroxybenzophenones by using Friedel‐Crafts reaction, and to measure the inhibitory activity on α‐glucosidase with p‐nitrophenyl‐β‐D‐galactopyranoside (PNPG) as a substrate. Here, acarbose (IC50 = 1674.75 µmol L−1) was used as the reference inhibitor. The results demonstrated that most of the target compounds had remarkable inhibitory activities

  本实验旨在利用Friedel-Crafts反应合成18种多羟基二苯甲酮，以对硝基苯基-β-D-吡喃半乳糖苷（PNPG）为底物，测定对α-葡萄糖苷酶的抑制活性。在这里，阿卡波糖 (IC50 = 1674.75 µmol L - 1) 用作参考抑制剂。结果表明，大多数目标化合物对α-葡萄糖苷酶具有显着的抑制活性。在所有这些化合物中，2,4,4', 6-butahydroxydiphenylketone (11) 被发现是最有效的 α-葡萄糖苷酶抑制剂，IC50 值为 10.62 µmol L - 1。此外，我们通过动力学分析发现这些化合物是竞争性抑制剂。结果表明，此类化合物可用于开发新的糖尿病治疗候选药物。
• Resist underlayer film-forming composition
  申请人：NISSAN CHEMICAL CORPORATION

  公开号：US11287741B2

  公开（公告）日：2022-03-29

  A composition for forming a resist underlayer film that functions as an anti-reflective coating during exposure and can be embedded in a recess having a narrow space and a high aspect ratio, and has excellent resistance to an aqueous hydrogen peroxide solution. A resist underlayer film-forming composition containing a resin, a compound of the following Formula (1a) or (1b): wherein X is carbonyl group or methylene group, 1 and m are each independently an integer of 0 to 5 and satisfy a relational expression of 3≤1+m 10, and n is an integer of 2 to 5, and a solvent, wherein the compound of Formula (1a) or (1b) is contained in an amount of 0.01% by mass to 60% by mass relative to the amount of the resin.

  一种用于形成抗蚀剂底层膜的组合物，该抗蚀剂底层膜在曝光时可用作抗反射涂层，并可嵌入具有窄空间和高长宽比的凹槽中，而且对过氧化氢水溶液具有优异的耐受性。抗蚀剂底层成膜组合物含有树脂、下式（1a）或（1b）的化合物： 其中 X 是羰基或亚甲基，1 和 m 各自独立地为 0 至 5 的整数，且满足 3≤1+m 10 的关系式，n 是 2 至 5 的整数，以及溶剂，其中式 (1a) 或 (1b) 化合物的含量为树脂含量的 0.01% 至 60%。
• Synthesis and biological evaluation of polyhydroxy benzophenone as mushroom tyrosinase inhibitors
  作者：Jianlong Wu、Xuesen Hu、Lin Ma

  DOI：10.3109/14756366.2010.521745

  日期：2011.6.1

  A series of polyhydroxy benzophenone were synthesized and evaluated as mushroom tyrosinase inhibitors. The results demonstrated that most of the target compounds had remarkable inhibitory activities on mushroom tyrosinase. Among all these compounds, 2,3,4,3'',4'',5''-hexahydroxy-diphenylketone 10 was found to be the most potent tyrosinase inhibitor with IC50 value of 1.4 mu mu M. In addition, the inhibition kinetics analyzed by Lineweaver--Burk plots revealed that such compounds were competitive inhibitors. These results suggested that such compounds might be utilized for the development of new candidate for treatment of dermatological disorders.
• RESIST UNDERLAYER FILM-FORMING COMPOSITION
  申请人：NISSAN CHEMICAL CORPORATION

  公开号：US20200201184A1

  公开（公告）日：2020-06-25

  A composition for forming a resist underlayer film that functions as an anti-reflective coating during exposure and can be embedded in a recess having a narrow space and a high aspect ratio, and has excellent resistance to an aqueous hydrogen peroxide solution. A resist underlayer film-forming composition containing a resin, a compound of the following Formula (1 a ) or (1 b ): wherein X is carbonyl group or methylene group, 1 and m are each independently an integer of 0 to 5 and satisfy a relational expression of 3≤1+m 10, and n is an integer of 2 to 5, and a solvent, wherein the compound of Formula (1 a ) or (1 b ) is contained in an amount of 0.01% by mass to 60% by mass relative to the amount of the resin.