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Allyl-p-vinylbenzensulfonat | 42094-53-1

中文名称
——
中文别名
——
英文名称
Allyl-p-vinylbenzensulfonat
英文别名
Prop-2-enyl 4-ethenylbenzenesulfonate
Allyl-p-vinylbenzensulfonat化学式
CAS
42094-53-1
化学式
C11H12O3S
mdl
——
分子量
224.28
InChiKey
SKOBSEPWXLJVNC-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    2.6
  • 重原子数:
    15
  • 可旋转键数:
    5
  • 环数:
    1.0
  • sp3杂化的碳原子比例:
    0.09
  • 拓扑面积:
    51.8
  • 氢给体数:
    0
  • 氢受体数:
    3

文献信息

  • Compositions for surface treatment, polymers therefor, and method of surface treatment
    申请人:IMPERIAL CHEMICAL INDUSTRIES PLC
    公开号:EP0232006A2
    公开(公告)日:1987-08-12
    Coating composition suitable for treating a surface so as to provide a water-erodible coating thereon, which composition comprises at least one erodible polymer comprising one or more hydrolysable groups selected from sulphonate esters and sulphate esters which in an aqueous environment will generate by hydrolysis corresponding polymer-bound acid groups. The erodible polymrers are described in detail and a method of treating surfaces using the composition is described.
    适用于处理表面以在其上形成可侵蚀涂层的涂料组合物,该组合物包含至少一种可侵蚀聚合物,其中包含一个或多个可解基团,这些基团选自磺酸酯和硫酸酯,在环境中会通过解产生相应的聚合物结合酸基。 详细描述了可侵蚀聚合物,并介绍了使用该组合物处理表面的方法。
  • POLYCHLOROPRENE-BASE LATEX AND METHOD FOR PRODUCING IT
    申请人:OZOE Shinji
    公开号:US20080125572A1
    公开(公告)日:2008-05-29
    To provide a polychloroprene-base latex having improved adhesiveness and water resistance over conventional polychloroprene-base latex adhesives. A polychloroprene-base latex containing 2% or less by weight of a conventional emulsifier, and an acid functional group-terminated polychloroprene-type polymer represented by the following formula (1) or a polychloroprene-base random copolymer with hydrophilic group, and a method for producing the polychloroprene-base latex: (polychloroprene-type polymer)-S—R—X   (1) (wherein X represents a carboxyl group or its salt; represents an alkyl group, an aryl group, a substituted alkyl group or a substituted aryl group).
  • CHLOROPRENE-BASED BLOCK COPOLYMER, SOAPLESS POLYCHLOROPRENE-BASED LATEX, AND PROCESSES FOR PRODUCING THE SAME
    申请人:Ozoe Shinji
    公开号:US20090036608A1
    公开(公告)日:2009-02-05
    An object of the present invention is to provide a novel polychloroprene-based copolymer, a soapless polychloroprene-based latex, and a process for producing the same in a simple and convenient manner, which are intended to be used for the improvement in adhesiveness and water resistance of a conventional polychloroprene adhesive or the improvement in oil resistance and adhesiveness of a styrene-butadiene block copolymer. The invention relates to a chloroprene-based block copolymer comprising a polymer (A) having a composition represented by the following formula (1) and a chloroprene-based polymer (B), the polymer (A) being linked to one terminal or both terminals of the chloroprene-based polymer (B), and the total amount of the 1,2-bond and the isomerized 1,2-bond in the chloroprene-based polymer (B) as determined by carbon-13 nuclear magnetic resonance spectrometry being 2.0 mol % or less; a soapless polychloroprene-based latex comprising an amphipathic chloroprene copolymer having a hydrophobic chloroprene-based polymer and a hydrophilic oligomer or polymer having an acidic functional group linked to the hydrophobic chloroprene-based polymer and 2 wt % or less of an emulsifying agent; and a process for producing the same: wherein U represents hydrogen, a methyl group, a cyano group, or a substituted alkyl group; V represents a phenyl group, a substituted phenyl group, a carboxyl group, an alkoxycarbonyl group, a substituted alkoxycarbonyl group, an allyloxycarbonyl group, a substituted allyloxycarbonyl group, an acyloxy group, a substituted acyloxy group, an amido group, or a substituted amido group; X represents hydrogen, a methyl group, chlorine, or a cyano group; Y represents hydrogen, chlorine, or a methyl group; Q represents a polymerization residue of maleic anhydride, citraconic acid, maleic acid, fumalic acid, a maleate ester, or a fumalate ester; and k, n, and m each represents an integer of 0 or more.
  • US5004631A
    申请人:——
    公开号:US5004631A
    公开(公告)日:1991-04-02
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同类化合物

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