4,5-dichloro-2-guanidinobenzimidazole | 70590-33-9

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 苯并咪唑类
• 英文名称: 4,5-dichloro-2-guanidinobenzimidazole
• 英文别名: 2-(4,5-dichloro-1H-benzimidazol-2-yl)guanidine
• CAS: 70590-33-9
• 化学式: C₈H₇Cl₂N₅
• 分子量: 244.083
• InChiKey: MGPBSRIRPVFAOU-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.6
• 重原子数：
  15
• 可旋转键数：
  1
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.0
• 拓扑面积：
  93.1
• 氢给体数：
  3
• 氢受体数：
  2

文献信息

• Method for reducing a susceptibility to tumor formation induced by 3-deoxyglucosone and precursors thereof
  申请人：Brown R. Truman

  公开号：US20060089316A1

  公开（公告）日：2006-04-27

  Disclosed are methods of using various compounds, which are known to bind to 3-deoxyglucosone (3DG) or precursors thereof, in order to reduce a susceptibility to tumor formation and/or to prevent or delay onset of tumor formation induced by 3DG and its precursors. Also disclosed is the reduction of 3DG levels in high fructose corn syrop so that the high fructose corn syrup is less likely to induce tumor formation.

  公开了使用各种已知与3-脱氧葡萄糖酮（3DG）或其前体结合的化合物的方法，以减少对肿瘤形成的易感性和/或预防或延迟由3DG及其前体诱导的肿瘤形成。还公开了降低高果糖玉米糖浆中3DG水平的方法，以使高果糖玉米糖浆不太可能诱导肿瘤形成。
• Cleaning formulation for removing residues on surfaces
  申请人：Fujifilm Electronic Materials U.S.A., Inc.

  公开号：US10253282B2

  公开（公告）日：2019-04-09

  This disclosure relates to a cleaning composition that contains 1) at least one redox agent; 2) at least one first chelating agent, the first chelating agent being a polyaminopolycarboxylic acid; 3) at least one second chelating agent different from the first chelating agent, the second chelating agent containing at least two nitrogen-containing groups; 4) at least one metal corrosion inhibitor, the metal corrosion inhibitor being a substituted or unsubstituted benzotriazole; 5) at least one organic solvent selected from the group consisting of water soluble alcohols, water soluble ketones, water soluble esters, and water soluble ethers; 6) water; and 7) optionally, at least one pH adjusting agent, the pH adjusting agent being a base free of a metal ion. This disclosure also relates to a method of using the above composition for cleaning a semiconductor substrate.

  本公开涉及一种清洁组合物，其中包含：1）至少一种氧化还原剂；2）至少一种第一螯合剂，第一螯合剂为聚氨基多羧酸；3）至少一种不同于第一螯合剂的第二螯合剂，第二螯合剂含有至少两个含氮基团；4) 至少一种金属缓蚀剂，该金属缓蚀剂为取代或未取代的苯并三唑； 5) 至少一种有机溶剂，该有机溶剂选自由水溶性醇、水溶性酮、水溶性酯和水溶性醚组成的组； 6) 水；以及 7) 可选地，至少一种 pH 值调节剂，该 pH 值调节剂为不含金属离子的碱。本公开还涉及一种使用上述组合物清洗半导体基底的方法。
• CLEANING FORMULATION FOR REMOVING RESIDUES ON SURFACES
  申请人：FujiFilm Electronic Materials USA, Inc.

  公开号：EP3077129B1

  公开（公告）日：2020-11-11
• CLEANING FORMULATION AND METHOD FOR REMOVING RESIDUES ON SURFACES
  申请人：Fujifilm Electronic Materials USA, Inc.

  公开号：EP3104398B1

  公开（公告）日：2020-03-11
• US4003971A
  申请人：——

  公开号：US4003971A

  公开（公告）日：1977-01-18