申请人:NISSAN CHEMICAL INDUSTRIES, LTD.
公开号:US20170153548A1
公开(公告)日:2017-06-01
The present invention provides a novel resist underlayer film-forming composition capable of forming a resist underlayer film that has etching resistance and excellent embeddability in a surface having concave portions and/or convex portions. A resist underlayer film-forming composition comprising a polymer having a structural unit represented by formula (1) or formula (2):
(wherein X is an arylene group, n is 1 or 2, and R
1
, R
2
, R
3
, and R
4
are each independently a hydrogen atom, a hydroxy group, a C
1-3
alkyl group, or a phenyl group), and a solvent.