(4-phenylthiophenyl).diphenylsulfonium p-toluenesulfonate | 110928-18-2

• 分子结构分类: 有机化合物 - 有机硫化合物 - 硫醚类
• 英文名称: (4-phenylthiophenyl).diphenylsulfonium p-toluenesulfonate
• 英文别名: Diphenyl-(4-phenylsulfanylphenyl)sulfanium;4-methylbenzenesulfonate
• CAS: 110928-18-2
• 化学式: C₇H₇O₃S*C₂₄H₁₉S₂
• 分子量: 542.744
• InChiKey: AGFLUIPDTLQXFW-UHFFFAOYSA-M

计算性质

• 辛醇/水分配系数(LogP)：
  7.83
• 重原子数：
  37
• 可旋转键数：
  5
• 环数：
  5.0
• sp3杂化的碳原子比例：
  0.03
• 拓扑面积：
  91.9
• 氢给体数：
  0
• 氢受体数：
  4

文献信息

• Compound having silsesquioxane skeleton and its polymer
  申请人：Inagaki Jyun-ichi

  公开号：US20050009982A1

  公开（公告）日：2005-01-13

  The present invention relates to a compound represented by Formula (1) and a polymer obtained using the compound: wherein R 1 is phenyl which may have substituents, Q 1 is hydrogen, halogen, alkyl having 1 to 10 carbon atoms, cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, cyclohexenyl or phenyl in which optional hydrogen may be replaced by halogen or alkyl having 1 to 5 carbon atoms, and Q 2 is a group represented by Formula (2) wherein the code < represents a bonding point with silicon, l, m, n and p are independently 0, 1, 2 or 3, A 1 to A 4 are independently a single bond, 1,4-cyclohexylene, 1,4-cyclohexenylene, a condensed ring group having 6 to 10 carbon atoms which is a divalent group, or 1,4-phenylene, Z 0 to Z 3 are independently a single bond, —CH═CR—, —C≡C—, —COO—, —OCO—, or alkylene having 1 to 20 carbon atoms, and Z 4 is a single bond, —CH═CH—, —C≡C—, —COO—, —OCO—, or alkylene having 1 to 20 carbon atoms. And Y 1 in Formula (1) is the group defined in Claim 1.

  本发明涉及一种由式（1）表示的化合物和使用该化合物获得的聚合物：其中R1是苯基，可能具有取代基；Q1是氢、卤素、具有1至10个碳原子的烷基、环丙基、环丁基、环戊基、环己基、环己烯基或苯基，其中可选的氢原子可被卤素或具有1至5个碳原子的烷基取代；Q2是由式（2）表示的基团，其中代码<表示与硅的连接点，l、m、n和p独立地为0、1、2或3，A1至A4独立地为单键、1,4-环己亚基、1,4-环己烯亚基、具有6至10个碳原子的缩合环基团，为二价基团，或1,4-苯亚基，Z0至Z3独立地为单键、—CH═CR—、—C≡C—、—COO—、—OCO—或具有1至20个碳原子的烷基，Z4为单键、—CH═CH—、—C≡C—、—COO—、—OCO—或具有1至20个碳原子的烷基。式（1）中的Y1是权利要求1中定义的基团。
• Novel carbazole derivative and chemically amplified radiation-sensitive resin composition
  申请人：——

  公开号：US20020172885A1

  公开（公告）日：2002-11-21

  A carbazole derivative of the following formula (1), 1 wherein R 1 and R 2 individually represent a hydrogen atom or a monovalent organic group, or R 1 and R 2 form, together with the carbon atom to which R 1 and R 2 bond, a divalent organic group having a 3-8 member carbocyclic structure or a 3-8 member heterocyclic structure, and R 3 represents a hydrogen atom or a monovalent organic group. The carbazole derivative is suitable as an additive for increasing sensitivity of a chemically amplified resist. A chemically amplified radiation-sensitive resin composition, useful as a chemically amplified resist, comprising the carbazole derivative is also disclosed.

  以下是该段文字的中文翻译： 一种具有以下式（1）的咔唑衍生物，其中R1和R2分别代表氢原子或一价有机基团，或者R1和R2与其结合的碳原子一起形成具有3-8个成员碳环结构或3-8个成员杂环结构的二价有机基团，R3代表氢原子或一价有机基团。该咔唑衍生物适用作为增加化学增感抗蚀性的添加剂。还公开了一种化学增感辐射敏感树脂组合物，该组合物用作化学增感抗蚀剂，包括该咔唑衍生物。
• Novel anthracene derivative and radiation-sensitive resin composition
  申请人：——

  公开号：US20030194634A1

  公开（公告）日：2003-10-16

  A novel anthracene derivative useful as an additive to a radiation-sensitive resin composition is disclosed. The anthracene derivative has the following formula (1), 1 wherein R 1 groups individually represent a hydroxyl group or a monovalent organic group having 1-20 carbon atoms, n is an integer of 0-9, X is a single bond or a divalent organic group having 1-12 carbon atoms, and R 2 represents a monovalent acid-dissociable group. The radiation-sensitive resin composition comprises the anthracene derivative of the formula (1), a resin insoluble or scarcely soluble in alkali, but becomes alkali soluble in the presence of an acid, and a photoacid generator. The composition is useful as a chemically-amplified resist for microfabrication utilizing deep ultraviolet rays, typified by a KrF excimer laser and ArF excimer laser.

  揭示了一种作为辐射敏感树脂组合物添加剂有用的新型蒽衍生物。该蒽衍生物具有以下化学式（1），其中R1基分别表示一个羟基或具有1-20个碳原子的一价有机基团，n是0-9的整数，X是一个单键或具有1-12个碳原子的二价有机基团，R2表示一价酸可解离基团。辐射敏感树脂组合物包括化学式（1）的蒽衍生物，一种在碱性条件下不溶或几乎不溶但在存在酸时变为碱溶的树脂，以及光酸发生剂。该组合物可用作化学放大光刻胶，用于利用KrF准分子激光和ArF准分子激光等深紫外线进行微加工。
• Photopolymerizable oxetane derivative and liquid-crystal composition containing it
  申请人：Syundo Ryushi

  公开号：US20050224757A1

  公开（公告）日：2005-10-13

  Provided are a liquid-crystal compound and a liquid-crystal composition containing the compound, of which the advantages are that they show nematic hybrid orientation on a rubbed TAC substrate, they are polymerizable in open air and they readily give a polymer having a high degree of polymerization even when exposed to a relatively small total quantity of light. The films formed by photopolymerizing them keep nematic hybrid orientation. The compound is represented by formula (1): wherein R 1 is a hydrogen or an alkyl; R 2 is a hydrogen, —OCF 3 , etc.; A 1 is a 1,4-phenylene, etc.; A 2 and A 3 are independently a 1,4-cyclohexylene, a 1,4-phenylene, etc.; X 1 is a single bond, —O—, etc.; X 2 and X 3 are independently a single bond, —COO—, —C≡C—, —CONH—, etc.; m is an integer of from 0 to 20; and n is 1 or 0.

  提供了一种液晶化合物和含有该化合物的液晶组合物，其优点是它们在擦拭的TAC基板上显示出向列杂向，它们可以在空气中聚合，并且即使暴露在相对较小的总光量下，它们也能很容易地形成高度聚合的聚合物。通过光聚合它们形成的薄膜保持向列杂向。该化合物由式（1）表示：其中R1为氢或烷基；R2为氢，—OCF3等；A1为1,4-苯撑等；A2和A3独立地为1,4-环己撑，1,4-苯撑等；X1为单键，—O—等；X2和X3独立地为单键，—COO—，—C≡C—，—CONH—等；m为0至20的整数；n为1或0。
• Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition
  申请人：——

  公开号：US20030113658A1

  公开（公告）日：2003-06-19

  A novel photoacid generator containing a structure of the following formula (I), 1 wherein R is a monovalent organic group with a fluorine content of 50 wt % or less, a nitro group, a cyano group, or a hydrogen atom, and Z 1 and Z 2 are individually a fluorine atom or a linear or branched perfluoroalkyl group having 1-10 carbon atoms, is provided. When used in a chemically amplified radiation-sensitive resin composition, the photoacid generator exhibits high transparency, comparatively high combustibility, and no bioaccumulation, and produces an acid exhibiting high acidity, high boiling point, moderately short diffusion length in the resist coating, and low dependency to mask pattern density.

  提供一种新型光酸发生剂，其含有以下式(I)的结构，其中R是一种具有50重量％或以下氟含量，硝基，氰基或氢原子的一价有机基团，Z1和Z2分别是氟原子或具有1-10个碳原子的线性或支链全氟烷基团。当用于化学增感辐射敏感树脂组成物中时，该光酸发生剂表现出高透明度，相对高的可燃性和无生物积累，并产生具有高酸度，高沸点，适度短的扩散长度在抗蚀涂层中，并且对掩模图案密度的依赖性低的酸。