Dibenzylmethylsulfoniumion | 29245-63-4

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: Dibenzylmethylsulfoniumion
• 英文别名: Dibenzylmethylsulfonium；Dibenzyl(methyl)sulfanium
• CAS: 29245-63-4
• 化学式: C₁₅H₁₇S
• 分子量: 229.366
• InChiKey: ZXGSJCDPPHGUJN-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.9
• 重原子数：
  16
• 可旋转键数：
  4
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.2
• 拓扑面积：
  1
• 氢给体数：
  0
• 氢受体数：
  0

文献信息

• Salt suitable for an acid generator and a chemically amplified resist composition containing the same
  申请人：Yamaguchi Satoshi

  公开号：US20070122750A1

  公开（公告）日：2007-05-31

  The present invention provides a salt of the formula (I): wherein ring X represents monocyclic or polycyclic hydrocarbon group having 3 to 30 carbon atoms, and one or more hydrogen atom in the monocyclic or polycyclic hydrocarbon group is optionally substituted with alkyl group having 1 to 10 carbon atom, alkoxy group having 1 to 10 carbon atom, perfluoroalkyl group having 1 to 4 carbon atoms, hydroxyalkyl group having 1 to 10 carbon atoms or cyano group; Q 1 and Q 2 each independently represent fluorine atom or perfluoroalkyl group having 1 to 6 carbon atoms; and A + represents organic counter ion. The present invention also provides a chemically amplified resist composition comprising the salt of the formula (I).

  本发明提供了一种公式（I）的盐： 其中，环X代表具有3至30个碳原子的单环或多元环烃基团，并且单环或多元环烃基团中的一个或多个氢原子可被选地取代为具有1至10个碳原子的烷基、具有1至10个碳原子的烷氧基、具有1至4个碳原子的全氟烷基、具有1至10个碳原子的羟基烷基或腈基；Q1和Q2各自独立地代表氟原子或具有1至6个碳原子的全氟烷基；以及A+代表有机反离子。 本发明还提供了一种包含公式（I）的盐的化学放大抗蚀剂组合物。
• Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same
  申请人：Shigematsu Junji

  公开号：US20080086014A1

  公开（公告）日：2008-04-10

  The present invention provides a salt represented by the formula (I): wherein X represents a C3-C30 divalent group containing at least one divalent alicyclic hydrocarbon group, and at least one —CH 2 — in the C3-C30 divalent group may be substituted with —O— or —CO—, Y represents a C3-C30 cyclic hydrocarbon group which may be substituted with at least one group selected from a C1-C6 alkoxy group, a C1-C4 perfluoroalkyl group, a C1-C6 hydroxyalkyl group, a hydroxyl group and a cyano group, and at least one —CH 2 — in the C3-C30 cyclic hydrocarbon group may be substituted with —O— or —CO—, Q 1 and Q 2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, and A + represents an organic counter ion.

  本发明提供了一种由公式(I)表示的盐：其中X代表含至少一个二价脂环烃基的C3-C30二价基团，并且C3-C30二价基团中的至少一个—CH2—可以被—O—或—CO—取代，Y代表一个C3-C30环烃基，该环烃基可以至少被选自C1-C6烷氧基、C1-C4全氟烷基、C1-C6羟基烷基、羟基和氰基的至少一个取代基取代，并且C3-C30环烃基中的至少一个— —可以被—O—或—CO—取代，Q1和Q2各自独立地代表一个氟原子或一个C1-C6全氟烷基，以及A+代表一个有机反离子。
• Resin suitable for an acid generator and a chemically amplified positive resist composition containing the same
  申请人：Ando Nobuo

  公开号：US20070149702A1

  公开（公告）日：2007-06-28

  The present invention provides a resin which generates an acid by irradiation and is a salt of an organic cation and an anionic polymer wherein the anionic polymer has no carbon-carbon unsaturated bond. The present invention further provides a chemically amplified resist composition comprising the same.

  本发明提供了一种树脂，通过辐射产生酸，是有机阳离子和阴离子聚合物的盐，其中阴离子聚合物没有碳-碳不饱和键。本发明还提供了包含该树脂的化学增感光阻组合物。
• CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION
  申请人：Kamabuchi Akira

  公开号：US20090286937A1

  公开（公告）日：2009-11-19

  The present invention provides a chemically amplified positive composition comprising a resin which comprises a structural unit having an acid-labile group in a side chain and a structural unit represented by the formula (I): wherein R 1 represents a hydrogen atom etc., R′ and R″ are independently a hydrogen atom etc., k represents an integer of 1 to 12, R is independently a C1-C6 alkyl group etc. and x represents an integer of 0 to 7, and an acid generator represented by the formula (V): wherein Y 1 and Y 2 each independently represent a fluorine atom etc., R12 represents a C1-C30 linear, branched chain or cyclic hydrocarbon group which may be substituted, and A + represents an organic counter ion.

  本发明提供了一种化学增感正性组合物，包括一个树脂，该树脂包括一个侧链中含有酸敏感基团的结构单元和一个由式(I)表示的结构单元：其中R1代表氢原子等，R'和R"各自独立地代表氢原子等，k表示1到12的整数，R独立地代表C1-C6烷基等，x表示0到7的整数，以及由式(V)表示的酸发生剂：其中Y1和Y2各自独立地代表氟原子等，R12代表C1-C30线性、支链或环烃基，可以被取代，A+代表有机对离子。
• RESIN SUITABLE FOR AN ACID GENERATOR AND A CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION CONTAINING THE SAME
  申请人：ANDO Nobuo

  公开号：US20110165519A1

  公开（公告）日：2011-07-07

  The present invention provides a resin which generates an acid by irradiation and is a salt of an organic cation and an anionic polymer wherein the anionic polymer has no carbon-carbon unsaturated bond. The present invention further provides a chemically amplified resist composition comprising the same.

  本发明提供了一种树脂，该树脂通过辐射发生酸化作用，是有机阳离子和阴离子聚合物的盐，其中阴离子聚合物没有碳-碳不饱和键。本发明还提供了包含该树脂的化学增感光阻组合物。