2.4-Dioxo-5-aethyl-5-phenyl-hexahydro-pyrimidin | 2240-17-7

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 二嗪类
• 英文名称: 2.4-Dioxo-5-aethyl-5-phenyl-hexahydro-pyrimidin
• 英文别名: 5-ethyl-5-phenyl-dihydro-pyrimidine-2,4-dione；5-Aethyl-5-phenyl-dihydro-pyrimidin-2,4-dion；5-Ethyl-5-phenyl-1,3-diazinane-2,4-dione
• CAS: 2240-17-7
• 化学式: C₁₂H₁₄N₂O₂
• 分子量: 218.255
• InChiKey: ROSGDGPUHXBTRO-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.3
• 重原子数：
  16
• 可旋转键数：
  2
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.33
• 拓扑面积：
  58.2
• 氢给体数：
  2
• 氢受体数：
  2

反应信息

• 作为产物：
  描述：

  alkaline earth salt of/the/ methylsulfuric acid 在 硫酸 作用下， 生成 2.4-Dioxo-5-aethyl-5-phenyl-hexahydro-pyrimidin
  参考文献：
  名称：

  Testa et al., Farmaco, Edizione Scientifica, 1958, vol. 13, p. 437,445

  摘要：

  DOI：

文献信息

• RESIST UNDERLAYER FILM-FORMING COMPOSITION AND METHOD FOR FORMING RESIST PATTERN USING THE SAME
  申请人：NISSAN CHEMICAL INDUSTRIES, LTD.

  公开号：US20170045820A1

  公开（公告）日：2017-02-16

  A composition for forming a resist underlayer film which make possible to form a desired high-adhesion resist pattern. A resist underlayer film-forming composition for lithography containing a polymer having the following structure Formula (1) or (2) at a terminal of a polymer chain, crosslinker, compound promoting crosslinking reaction, and organic solvent. (wherein R 1 is a C 1-6 alkyl group optionally having a substituent, phenyl group, pyridyl group, halogeno group, or hydroxy group, R 2 is a hydrogen atom, a C 1-6 alkyl group, hydroxy group, halogeno group, or ester group of —C(═O)O—X wherein X is a C 1-6 alkyl group optionally having a substituent, R 3 is a hydrogen atom, a C 1-6 alkyl group, hydroxy group, or halogeno group, R 4 is a direct bond or divalent C 1-8 organic group, R 5 is a divalent C 1-8 organic group, A is an aromatic ring or heteroaromatic ring, t is 0 or 1, and u is 1 or 2.)
• US9910354B2
  申请人：——

  公开号：US9910354B2

  公开（公告）日：2018-03-06
• Testa et al., Farmaco, Edizione Scientifica, 1958, vol. 13, p. 437,445
  作者：Testa et al.

  DOI：——

  日期：——