作者:Olga Kushch、Iryna Hordieieva、Katerina Novikova、Yurii Litvinov、Mykhailo Kompanets、Alexander Shendrik、Iosip Opeida
DOI:10.1021/acs.joc.0c00506
日期:2020.6.5
N-oxyl radicals of various structures were generated by oxidation of corresponding N-hydroxy compounds with iodobenzene diacetate, [bis(trifluoroacetoxy)]iodobenzene, and ammonium cerium(IV) nitrate in acetonitrile. The decay rate of N-oxyl radicals follows first-order kinetics and depends on the structure of N-oxyl radicals, reaction conditions, and the nature of the solvent and oxidant. The values
Ñ通过相应的氧化产生各种结构的基团-1-氧基Ñ与二乙酸碘苯,[双(三氟乙酰氧基)]碘苯,和铵铈(IV)铵的乙腈-羟基化合物。N-氧基自由基的衰减速率遵循一阶动力学,并且取决于N-氧基自由基的结构,反应条件以及溶剂和氧化剂的性质。自衰减常数变化的内1.4×10的值-4小号-1为3,4,5,6- tetraphenylphthalimide- Ñ -1-氧基自由基至1.4×10 -2小号-1为1-苯并三唑Ñ-氧基自由基。结果表明,苯环上具有不同的吸电子或-给体取代基的邻苯二甲酰亚胺-N-氧基自由基的衰变速率常数在大多数情况下都高于未取代的邻苯二甲酰亚胺-N-氧基自由基。研究了溶剂对邻苯二甲酰亚胺-N-氧基自由基自分解过程的影响。显示了速率常数对Gutmann供体数的依赖性。