PHOTOSENSITIVE RESIN COMPOSITIONS, PROCESSES FOR PREPARING CURED FILMS, THE RESULTING CURED FILMS, ORGANIC EL DISPLAY DEVICES AND LIQUID CRYSTAL DISPLAY DEVICES
申请人:FUJIFILM Corporation
公开号:US20150148546A1
公开(公告)日:2015-05-28
Provided is a photosensitive resin composition having high sensitivity and storage stability. The photosensitive resin composition comprises (A) a polymer component including a polymer satisfying at least one of (1) and (2) below:
(1) a polymer comprising (a1) a structural unit containing a group in which an acid group is protected by an acid-dissociable group, and (a2) a structural unit containing a crosslinkable group, and
(2) a polymer comprising (a1) a structural unit containing a group in which an acid group is protected by an acid-dissociable group, and a polymer comprising (a2) a structural unit containing a crosslinkable group;
(B) a compound represented by formula (I) below; and
(C) a solvent;
Photosensitive resin compositions, processes for preparing cured films, the resulting cured films, organic EL display devices and liquid crystal display devices
申请人:FUJIFILM Corporation
公开号:US09223211B2
公开(公告)日:2015-12-29
Provided is a photosensitive resin composition having high sensitivity and storage stability. The photosensitive resin composition comprises (A) a polymer component including a polymer satisfying at least one of (1) and (2) below:
(1) a polymer comprising (a1) a structural unit containing a group in which an acid group is protected by an acid-dissociable group, and (a2) a structural unit containing a crosslinkable group, and
(2) a polymer comprising (a1) a structural unit containing a group in which an acid group is protected by an acid-dissociable group, and a polymer comprising (a2) a structural unit containing a crosslinkable group;
(B) a compound represented by formula (I) below; and
(C) a solvent;