摩熵化学
数据库官网
小程序
打开微信扫一扫
首页 分子通 化学资讯 化学百科 反应查询 关于我们
请输入关键词

1-dodecyl-4-methyl-pyridinium; chloride | 79916-29-3

中文名称
——
中文别名
——
英文名称
1-dodecyl-4-methyl-pyridinium; chloride
英文别名
1-Dodecyl-4-methylpyridin-1-ium chloride;1-dodecyl-4-methylpyridin-1-ium;chloride
1-dodecyl-4-methyl-pyridinium; chloride化学式
CAS
79916-29-3
化学式
C18H32N*Cl
mdl
——
分子量
297.912
InChiKey
QPDSALLMZSDJIM-UHFFFAOYSA-M
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    2.21
  • 重原子数:
    20
  • 可旋转键数:
    11
  • 环数:
    1.0
  • sp3杂化的碳原子比例:
    0.72
  • 拓扑面积:
    3.9
  • 氢给体数:
    0
  • 氢受体数:
    1

反应信息

  • 作为反应物:
    参考文献:
    名称:
    新型花菁染料的合成,表面活性和胶束形成
    摘要:
    描述了三种具有两亲性的新型花青染料的合成,表面活性和胶束的形成。通过表面张力和吸收率测量的结合表明,在一种情况下,自组装是高度协作的,从而导致聚集体具有独特的吸收特性。
    DOI:
    10.1002/hlca.19810640627
  • 作为产物:
    描述:
    参考文献:
    名称:
    Surface-Active Properties and Their Photochemical Behaviors of (1-Alkyl-4-pyridiniomethyl)phosphonates
    摘要:
    (制备出了带有碳数为 8 至 18 的偶数长烷基链的(1-烷基-4-吡啶基甲基)膦酸盐。它们具有表面活性剂的特征。在碱性水介质中照射时,膦酸盐发生 C-P 键裂解,生成 1-烷基-4-甲基吡啶鎓膦酸盐,因此溶液的表面张力也发生了变化。在它们的临界胶束浓度下,C-P 键裂解的量子产率增加了两倍。
    DOI:
    10.1246/bcsj.63.3053
点击查看最新优质反应信息

文献信息

  • MATERIAL FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND COMPOUND
    申请人:SHIN-ETSU CHEMICAL CO., LTD.
    公开号:US20210286266A1
    公开(公告)日:2021-09-16
    The present invention is a material for forming an organic film, including: a compound shown by the following general formula (1); and an organic solvent, where in the general formula (1), X represents an organic group with a valency of “n” having 2 to 50 carbon atoms or an oxygen atom, “n” represents an integer of 1 to 10 , and R 1 independently represents any of the following general formulae (2), where in the general formulae (2), broken lines represent attachment points to X, and Q 1 represents a monovalent organic group containing a carbonyl group, at least a part of which is a group shown by the following general formulae (3), where in the general formulae (3), broken lines represent attachment points, X 1 represents a single bond or a divalent organic group having 1 to 20 carbon atoms optionally having a substituent when the organic group has an aromatic ring, R 2 represents a hydrogen atom, a methyl group, an ethyl group, or a phenyl group, and ** represents an attachment point. An object of the present invention is to provide a material for forming an organic film for forming an organic film having dry etching resistance, and also having high filling and planarizing properties and adhesion to a substrate.
    本发明是一种用于形成有机薄膜的材料,包括:由以下通用式(1)所示的化合物;和有机溶剂,在通用式(1)中,X代表具有2至50个碳原子或一个氧原子的价为“n”的有机基团,“n”表示1到10的整数,R1独立地表示以下通用式(2)中的任何一种,其中在通用式(2)中,虚线表示连接点到X,Q1表示含有羰基的一价有机基团,其中至少部分是以下通用式(3)所示的基团,其中在通用式(3)中,虚线表示连接点,X1表示单键或具有1到20个碳原子的二价有机基团,在有机基团具有芳香环时可选地具有取代基,R2表示氢原子、甲基基团、乙基基团或苯基团,**表示连接点。本发明的目的是提供一种用于形成具有干法刻蚀抗性的有机薄膜的材料,同时具有高填充和平整化性能以及对基底的粘附性。
  • ULTRAVIOLET ABSORBER, COMPOSITION FOR FORMING A RESIST UNDER LAYER FILM, AND PATTERNING PROCESS
    申请人:SHIN-ETSU CHEMICAL CO., LTD.
    公开号:US20160053087A1
    公开(公告)日:2016-02-25
    The present invention provides an ultraviolet absorber containing a compound represented by the formula (A-1), wherein R represents a methyl group, an ethyl group, a propyl group, or an allyl group, and R 1 , R 2 , R 3 , and R 4 may be the same or different, and each represent a hydrogen atom, a benzoyl group, a toluoyl group, a naphthoyl group, or an anthranoyl group. By adding the ultraviolet absorber to a composition for forming a resist under layer film, reflection can be suppressed particularly in lithography process by an ultraviolet laser, and a pattern profile can be improved without adverse effects on dry etching mask properties and adhesiveness to a resist pattern.
    本发明提供了一种含有式(A-1)所代表的化合物的紫外线吸收剂,其中R代表甲基基团、乙基基团、丙基基团或烯丙基基团,而R1、R2、R3和R4可以相同也可以不同,每个代表氢原子、苯甲酰基、甲苯酰基、甲酰基或甲酰基。通过将紫外线吸收剂添加到用于形成抗蚀底层膜的组合物中,可以在紫外线激光的光刻过程中特别抑制反射,并且可以改善图案轮廓而不会对干法刻蚀掩模特性和对抗蚀图案的附着性产生不良影响。
  • ORGANIC FILM COMPOSITION, PROCESS FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND COMPOUND
    申请人:SHIN-ETSU CHEMICAL CO., LTD.
    公开号:US20160336189A1
    公开(公告)日:2016-11-17
    An organic film composition including a compound represented by the following general formula (1), wherein n1 and n2 each independently represent 0 or 1; “W” represents a single bond or any of structures represented by the following formula (2); R 1 represents any of structures represented by the following general formula (3); m1 and m2 each independently represent an integer of 0 to 7, with the proviso that m1+m2 is 1 to 14. There can be provided an organic film composition for forming an organic film having dry etching resistance as well as advanced filling/planarizing characteristics.
    一种有机薄膜组合物,包括以下通式(1)所表示的化合物,其中n1和n2各自独立地表示0或1;“W”表示单键或以下式(2)所表示的任何结构之一;R1表示以下通式(3)所表示的任何结构之一;m1和m2各自独立地表示0到7的整数,但m1+m2为1到14。可以提供一种有机薄膜组合物,用于形成具有干法蚀刻抗性以及先进的填充/平坦化特性的有机薄膜。
  • METHOD FOR PRODUCING OPTICALLY ACTIVE DIAMINE DERIVATIVE
    申请人:Kawanami Koutarou
    公开号:US20120035369A1
    公开(公告)日:2012-02-09
    The problem to be solved is to provide an important intermediate for production of an FXa inhibitor. The solution thereto is a method for industrially producing a compound (1) or a compound (4), comprising: [Step 1]: adding a quaternary ammonium salt and a metal azide salt to water to prepare an aqueous solution of an azidification reagent complex comprising quaternary ammonium salt-metal azide salt, and subsequently dehydrating the aqueous solution using an aromatic hydrocarbon solvent to form a mixed solution of the azidification reagent complex comprising quaternary ammonium salt-metal azide salt and the aromatic hydrocarbon solvent with a water content of 0.2% or less; and [Step 2]: adding, to the mixed solution prepared in [Step 1], a compound (2) wherein L represents a leaving group.
    要解决的问题是提供生产FXa抑制剂的重要中间体。解决方案是一种工业生产化合物(1)或化合物(4)的方法,包括:[步骤1]:将季盐和属偶氮盐加入中,制备含季盐-属偶氮盐的偶氮化试剂复合物的溶液,随后使用芳香烃溶剂脱溶液,形成含季盐-属偶氮盐的偶氮化试剂复合物和芳香烃溶剂的混合溶液,含量为0.2%或以下; [步骤2]:向[步骤1]中制备的混合溶液中加入化合物(2),其中L表示离去基团。
  • RECOVERY METHOD AND REUSE METHOD OF OXO ACID CATALYST
    申请人:DAICEL CORPORATION
    公开号:US20160074856A1
    公开(公告)日:2016-03-17
    Provided is a method for easily and efficiently recovering an oxoacid catalyst without deterioration in reaction product yield and catalytic activity, where the oxoacid catalyst has been used in a reaction for oxidizing an organic compound with hydrogen peroxide, also provided is a method for producing an oxide in which an organic compound is oxidized with hydrogen peroxide using the oxoacid catalyst recovered by the method, to yield the corresponding oxide. A method according to the present invention recovers an oxoacid catalyst used in a reaction for oxidizing an organic compound with hydrogen peroxide in an aqueous/organic solvent two-phase system. The method includes Step 1 in which the pH in the reaction system is adjusted to 5.0 or higher so as to transfer the oxoacid catalyst to the aqueous phase, and the organic phase is removed.
    提供了一种方法,可以轻松高效地回收氧酸催化剂,而不会降低反应产物收率和催化活性。该氧酸催化剂已用于氧化有机化合物的反应中,使用过氧化氢。同时提供了一种方法,使用通过该方法回收的氧酸催化剂,将有机化合物与过氧化氢氧化,以产生相应的氧化物。本发明提供的方法在/有机溶剂两相体系中回收用于氧化有机化合物的氧酸催化剂。该方法包括步骤1,将反应体系中的pH调整至5.0或更高,以将氧酸催化剂转移至相,并去除有机相。
查看更多

同类化合物

(S)-氨氯地平-d4 (R,S)-可替宁N-氧化物-甲基-d3 (R)-(+)-2,2'',6,6''-四甲氧基-4,4''-双(二苯基膦基)-3,3''-联吡啶(1,5-环辛二烯)铑(I)四氟硼酸盐 (R)-N'-亚硝基尼古丁 (R)-DRF053二盐酸盐 (5E)-5-[(2,5-二甲基-1-吡啶-3-基-吡咯-3-基)亚甲基]-2-亚磺酰基-1,3-噻唑烷-4-酮 (5-溴-3-吡啶基)[4-(1-吡咯烷基)-1-哌啶基]甲酮 (5-氨基-6-氰基-7-甲基[1,2]噻唑并[4,5-b]吡啶-3-甲酰胺) (2S,2'S)-(-)-[N,N'-双(2-吡啶基甲基]-2,2'-联吡咯烷双(乙腈)铁(II)六氟锑酸盐 (2S)-2-[[[9-丙-2-基-6-[(4-吡啶-2-基苯基)甲基氨基]嘌呤-2-基]氨基]丁-1-醇 (2R,2''R)-(+)-[N,N''-双(2-吡啶基甲基)]-2,2''-联吡咯烷四盐酸盐 (1'R,2'S)-尼古丁1,1'-Di-N-氧化物 黄色素-37 麦斯明-D4 麦司明 麝香吡啶 鲁非罗尼 鲁卡他胺 高氯酸N-甲基甲基吡啶正离子 高氯酸,吡啶 高奎宁酸 马来酸溴苯那敏 马来酸氯苯那敏-D6 马来酸左氨氯地平 顺式-双(异硫氰基)(2,2'-联吡啶基-4,4'-二羧基)(4,4'-二-壬基-2'-联吡啶基)钌(II) 顺式-二氯二(4-氯吡啶)铂 顺式-二(2,2'-联吡啶)二氯铬氯化物 顺式-1-(4-甲氧基苄基)-3-羟基-5-(3-吡啶)-2-吡咯烷酮 顺-双(2,2-二吡啶)二氯化钌(II) 水合物 顺-双(2,2'-二吡啶基)二氯化钌(II)二水合物 顺-二氯二(吡啶)铂(II) 顺-二(2,2'-联吡啶)二氯化钌(II)二水合物 韦德伊斯试剂 非那吡啶 非洛地平杂质C 非洛地平 非戈替尼 非布索坦杂质66 非尼拉朵 非尼拉敏 雷索替丁 阿雷地平 阿瑞洛莫 阿扎那韦中间体 阿培利司N-6 阿伐曲波帕杂质40 间硝苯地平 间-硝苯地平 镉,二碘四(4-甲基吡啶)- 锌,二溴二[4-吡啶羧硫代酸(2-吡啶基亚甲基)酰肼]-