Thermally Persistent Fluorosulfonyl Nitrene and Unexpected Formation of the Fluorosulfonyl Radical
作者:Xiaoqing Zeng、Helmut Beckers、Helge Willner
DOI:10.1021/ja312073w
日期:2013.2.13
persistent triplet sulfonyl nitrene, FSO(2)N, was produced in the gas phase in high yields (up to 66%) by flash vacuum pyrolysis of FSO(2)N(3). Surprisingly, no rearrangement of FSO(2)N was observed, but the long-sought radical FSO(2) (22%) and traces of SO(2) (3%) were identified by IR ((15)N, (18)O, (34)S) spectroscopy. The photoinduced Curtius rearrangement of the nitrene to FNSO(2) was observed in
通过快速真空热解 FSO(2)N(3),在气相中以高产率(高达 66%)生产热持久性三重磺酰氮烯 FSO(2)N。令人惊讶的是,没有观察到 FSO(2)N 的重排,但是通过 IR ((15)N, (18) 确定了长期寻找的自由基 FSO(2) (22%) 和 SO(2) (3%) 的痕迹)O, (34)S) 光谱学。在固体惰性气体基质中观察到氮烯到 FNSO(2) 的光致 Curtius 重排,并研究了氮烯与 O(2)、NO 和 CO 的反应。