申请人:NIPPON PAINT CO., LTD.
公开号:EP0484021A1
公开(公告)日:1992-05-06
The present invention provides a positive type resist composition which has excellent photosensitivity in light decomposition. The composition comprises;
(a) a polymer having at least 70 % of isotactic construction, prepared from polymerizable monomers, at least a portion of which is a (meth)acrylate monomer having a group selected from the class consisting of a t-butyl group, a benzyl group, an alpha-methylbenzyl group, an alpha, alpha-dimethylbenzyl group and a trityl group, and
(b) a photoactivator which generates an acid in response to a light irradiation.
The present invention also provides a resist composition into which, instead of the polymer (a), a polymer (c) is formulated which has at least 70 % of isotactic construction and is prepared from polymerizable monomers, at least a portion of which is a hydroxyl styrene selected from the class consisting of p-t-butoxycarbonyloxystyrene, p-t-butoxycarbonyloxy-alpha-methyl-styrene, t-butyl-p-vinyl benzoate and t-butyl-p-isopropenylphenyloxy acetate.
本发明提供了一种正型抗蚀剂组合物,在光分解时具有极佳的光敏性。该组合物包括
(a) 由可聚合单体制备而成的聚合物,其中至少 70%为同素异形结构,该单体中 至少有一部分是(甲基)丙烯酸酯单体,该单体的基团选自叔丁基、苄基、 α-甲基苄基、α-α-二甲基苄基和三丁基组成的类别,以及
(b) 光活化剂,在光照射下产生一种酸。
本发明还提供了一种抗蚀剂组合物,其中配制了一种聚合物 (c),代替聚合物 (a),该聚合物 (c) 具有至少 70% 的同素异形结构,由可聚合单体制备而成、其中至少有一部分是羟基苯乙烯,选自对-叔丁氧基羰基氧基苯乙烯、对-叔丁氧基羰基氧基-α-甲基苯乙烯、对-乙烯基苯甲酸叔丁酯和对-异丙烯基苯氧基乙酸叔丁酯。