5-(2-氰乙基)海因 | 1007-06-3

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 唑烷类
• 中文名称: 5-(2-氰乙基)海因
• 英文名称: DL-5-cyanoethylhydantoin
• 英文别名: 3-(2,5-dioxo-imidazolidin-4-yl)-propionitrile；5-(β-cyanoethyl)hydantoin；5-(2-cyanoethyl)hydantoin；5-(2-Cyanoethyl)-hydantoin；5-Cyanoethyl-hydantoin；3-(2,5-Dioxoimidazolidin-4-yl)propanenitrile
• CAS: 1007-06-3
• 化学式: C₆H₇N₃O₂
• mdl: MFCD00798453
• 分子量: 153.14
• InChiKey: MMDZBDLRGFUSSP-UHFFFAOYSA-N

物化性质

• 熔点：
  109-110 °C
• 密度：
  1.263±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  -1
• 重原子数：
  11
• 可旋转键数：
  2
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.5
• 拓扑面积：
  82
• 氢给体数：
  2
• 氢受体数：
  3

安全信息

• 海关编码：
  2933990090

反应信息

• 作为反应物：
  描述：

  5-(2-氰乙基)海因 在 Tris-HCl buffer 、 Bacillus brevis No_.102 作用下， 反应 6.0h， 生成 (S)-2-amino-4-cyano-butyric acid
  参考文献：
  名称：

  Yamashiro, Akihiro; Yokozeki, Kenzo; Kano, Hideo, Agricultural and Biological Chemistry, 1988, vol. 52, # 11, p. 2851 - 2856

  摘要：

  DOI：

文献信息

• ANTIREFLECTION FILM FOR SEMICONDUCTOR CONTAINING CONDENSATION TYPE POLYMER
  申请人：Nissan Chemical Industries, Ltd.

  公开号：EP1757986A1

  公开（公告）日：2007-02-28

  There is provided an anti-reflective coating forming composition comprising a polymer having a pyrimidinetrione structure, imidazolidinedione structure, imidazolidinetrione structure or triazinetrione structure and a solvent. The anti-reflective coating obtained from the composition has a high preventive effect for reflected light, causes no intermixing with photoresists, and can use in lithography process by use of a light having a short wavelength such as ArF excimer laser beam (wavelength 193 nm) or F2 excimer laser beam (wavelength 157 nm), etc.

  本发明提供了一种抗反射涂层成型组合物，该组合物由具有嘧啶三酮结构、咪唑烷二酮结构、咪唑烷三酮结构或三嗪三酮结构的聚合物和溶剂组成。由该组合物制得的防反射涂层对反射光有很好的防止效果，不会与光刻胶混合，并可在光刻工艺中使用 ArF 准分子激光束（波长 193 nm）或 F2 准分子激光束（波长 157 nm）等短波长光。
• SULFONIC-ESTER-CONTAINING COMPOSITION FOR FORMATION OF ANTIREFLECTION FILM FOR LITHOGRAPHY
  申请人：Nissan Chemical Industries, Ltd.

  公开号：EP1813987A1

  公开（公告）日：2007-08-01

  There is provided an anti-reflective coating forming composition for lithography comprising a polymer compound, a crosslinking compound, a crosslinking catalyst, a sulfonate compound and a solvent. The anti-reflective coating obtained from the composition has a high preventive effect for reflected light, causes no intermixing with photoresists, has a higher dry etching rate compared with photoresists, can form a photoresist pattern having no footing at the lower part, and can use in lithography process by use of a light such as ArF excimer laser beam and F2 excimer laser beam, etc.

  本发明提供了一种用于光刻的抗反射涂层形成组合物，该组合物由聚合物化合物、交联化合物、交联催化剂、磺酸盐化合物和溶剂组成。由该组合物制得的抗反射涂层对反射光有很好的防止效果，不会与光刻胶混合，与光刻胶相比具有更高的干蚀刻率，可以形成下部无基底的光刻胶图案，并可在光刻工艺中使用 ArF 准分子激光束和 F2 准分子激光束等光源。
• Yokozeki, Kenzo; Nakamori, Shigeru; Yamanaka, Shigeru, Agricultural and Biological Chemistry, 1987, vol. 51, # 3, p. 715 - 720
  作者：Yokozeki, Kenzo、Nakamori, Shigeru、Yamanaka, Shigeru、Eguchi, Chikahiko、Mitsugi, Koji、Yoshinaga, Fumihiro

  DOI：——

  日期：——
• Yamashiro, Akihiro; Kubota, Koji; Yokozeki, Kenzo, Agricultural and Biological Chemistry, 1988, vol. 52, # 11, p. 2857 - 2864
  作者：Yamashiro, Akihiro、Kubota, Koji、Yokozeki, Kenzo

  DOI：——

  日期：——
• Yokozeki, Kenzo; Nakamori, Shigeru; Eguchi, Chikahiko, Agricultural and Biological Chemistry, 1987, vol. 51, # 2, p. 355 - 362
  作者：Yokozeki, Kenzo、Nakamori, Shigeru、Eguchi, Chikahiko、Yamada, Kazuhiko、Mitsugi, Koji

  DOI：——

  日期：——