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Sulfonium, diphenyl[4-(phenylthio)phenyl]- | 47480-44-4

中文名称
——
中文别名
——
英文名称
Sulfonium, diphenyl[4-(phenylthio)phenyl]-
英文别名
diphenyl-(4-phenylsulfanylphenyl)sulfanium
Sulfonium, diphenyl[4-(phenylthio)phenyl]-化学式
CAS
47480-44-4
化学式
C24H19S2+
mdl
——
分子量
371.5
InChiKey
OWZDULOODZHVCQ-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    8.1
  • 重原子数:
    26
  • 可旋转键数:
    5
  • 环数:
    4.0
  • sp3杂化的碳原子比例:
    0.0
  • 拓扑面积:
    26.3
  • 氢给体数:
    0
  • 氢受体数:
    1

文献信息

  • PHOTOACID GENERATOR, AND RESIN COMPOSITION FOR PHOTOLITHOGRAPHY
    申请人:SAN-APRO LTD.
    公开号:US20160368879A1
    公开(公告)日:2016-12-22
    Provided is a non-ionic photoacid generator (A) expressed by general formula (1). R1 and R2 each independently represents an alkyl group having 1-18 carbons or a fluoroalkyl group having 1-18 carbons, an alkenyl group having 2-18 carbons, an alkynyl group having 2-18 carbons, an aryl group having 6-18 carbons, a silyl group, or the like; m and n respectively represent the number of R1s and R2s, each number being an integer from 0 to 3, and the total number (m+n) of R1s and R2s being an integer from 1 to 6. The m number of R1s and the n number of R2s may each be the same or different. R3 represents a hydrocarbon having 1-18 carbons wherein one part or all of the hydrogen may be substituted by fluorine.
    提供的非离子光酸发生剂(A)由通式(1)表示。R1和R2分别独立表示具有1-18个碳原子的烷基基团或具有1-18个碳原子的氟烷基基团,具有2-18个碳原子的烯基基团,具有2-18个碳原子的炔基基团,具有6-18个碳原子的芳基基团,硅基团等;m和n分别表示R1和R2的数量,每个数字为0到3的整数,R1和R2的总数(m+n)为1到6的整数。R1的数量m和R2的数量n可以相同也可以不同。R3表示具有1-18个碳原子的碳氢化合物,其中氢的一部分或全部可以被氟取代。
  • Salt suitable for an acid generator and a chemically amplified resist composition containing the same
    申请人:Harada Yukako
    公开号:US20070078269A1
    公开(公告)日:2007-04-05
    The present invention provides a salt of the formula (I): wherein ring Y represents monocyclic or polycyclic hydrocarbon group having 3 to 30 carbon atoms, in which one —CH 2 — group is substituted with —COO— group, and at least one hydrogen atom in the monocyclic or polycyclic hydrocarbon group may optionally be substituted with alkyl group having 1 to 6 carbon atom, alkoxy group having 1 to 6 carbon atom, perfluoroalkyl group having 1 to 4 carbon atoms, hydroxyalkyl group having 1 to 6 carbon atoms, hydroxyl group or cyano group; Q 1 and Q 2 each independently represent fluorine atom or perfluoroalkyl group having 1 to 6 carbon atoms; A + represents organic counter ion; and n shows an integer of 0 to 12. The present invention also provides a chemically amplified resist composition comprising the salt of the formula (I).
    本发明提供了一种具有公式(I)的盐: 其中环Y代表具有3至30个碳原子的单环或多元环烃基团,其中一个—CH2—基团被—COO—基团取代,并且单环或多元环烃基团中的至少一个氢原子可以可选地被具有1至6个碳原子的烷基取代,具有1至6个碳原子的烷氧基,具有1至4个碳原子的全氟烷基,具有1至6个碳原子的羟基烷基,羟基或腈基;Q1和Q2各自独立地代表氟原子或具有1至6个碳原子的全氟烷基;A+代表有机反离子;n表示0至12的整数。 本发明还提供了一种含有公式(I)盐的化学放大抗蚀剂组合物。
  • SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME
    申请人:Ichikawa Koji
    公开号:US20110014566A1
    公开(公告)日:2011-01-20
    A salt represented by the formula (I-Pa): wherein X pa represents a single bond or a C1-C4 alkylene group, R pa represents a single bond, a C4-C36 divalent alicyclic hydrocarbon group or a C6-C36 divalent aromatic hydrocarbon group, and one or more methylene groups in the divalent alicyclic hydrocarbon group can be replaced by —O— or —CO—, Y pa represents a polymerizable group, and Z pa+ represents an organic cation.
    由公式(I-Pa)表示的盐,其中Xpa代表单一键或C1-C4亚烷基团,Rpa代表单一键、C4-C36二价脂环烃基团或C6-C36二价芳香烃基团,且脂环烃基团中的一个或多个亚甲基基团可以被—O—或—CO—替换,Ypa代表可聚合团,Zpa+代表有机阳离子。
  • SALT AND PROCESS FOR PRODUCING ACID GENERATOR
    申请人:YOSHIDA Isao
    公开号:US20110201823A1
    公开(公告)日:2011-08-18
    A salt represented by the formula (I0): wherein Q 1 and Q 2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, L 1 represents a divalent C1-C17 hydrocarbon group in which one or more —CH 2 — can be replaced by —O— or —CO—, m represents 1 or 2, and Z m+ represents m-valent organic or inorganic cation.
    根据您提供的化学公式(I0),其翻译成中文为: 其中Q1和Q2各自独立代表一个氟原子或一个C1-C6全氟烷基团,L1代表一个二价的C1-C17碳氢化合物基团,在该基团中,一个或多个—CH2—可以被—O—或—CO—所替换,m代表1或2,而Zm+代表m价有机或无机阳离子。
  • SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
    申请人:SUMITOMO CHEMICAL COMPANY, LIMITED
    公开号:US20160334702A1
    公开(公告)日:2016-11-17
    A salt represented by formula (I): wherein Q 1 and Q 2 independently represent a fluorine atom or a C 1 to C 6 perfluoroalkyl group, R 1 and R 2 in each occurrence independently represent a hydrogen atom, a fluorine atom or a C 1 to C 6 perfluoroalkyl group, z represents an integer of 0 to 6, X 1 represents *—CO—O—, *—O—CO— or —O—, * represents a binding position to C(R 1 )(R 2 ) or C(Q 1 )(Q 2 ), A 1 represents a C 4 to C 24 hydrocarbon group having a C 4 to C 18 divalent alicyclic hydrocarbon moiety, A 2 represents a C 2 to C 12 divalent hydrocarbon group, R 3 and R 4 independently represent a hydrogen atom or a C 1 to C 6 monovalent saturated hydrocarbon group, R 5 represents a hydrogen atom, a fluorine atom, or a C 1 to C 6 alkyl group where a hydrogen atom may be replaced by a fluorine atom, and Z + represents an organic cation.
    公式(I)表示的盐,其中Q1和Q2独立地代表一个氟原子或一个C1至C6的过氟烷基团,R1和R2每次出现独立地代表一个氢原子、一个氟原子或一个C1至C6的过氟烷基团,z代表0到6的整数,X1代表*—CO—O—,*—O—CO—或—O—,*代表与C(R1)(R2)或C(Q1)(Q2)的连接位置,A1代表具有C4至C18二价脂环烃基团的C4至C24的烃基团,A2代表C2至C12的二价烃基团,R3和R4独立地代表一个氢原子或一个C1至C6的一价饱和烃基团,R5代表一个氢原子、一个氟原子或一个C1至C6的烷基团,其中氢原子可以被氟原子替换,而Z+代表一个有机阳离子。
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