3,3,4,4-Tetrafluorotricyclo[4.2.1.0(2,5)]non-7-ene | 6654-42-8

• 分子结构分类: 有机化合物 - 有机卤素化合物 - 有机氟化物
• 英文名称: 3,3,4,4-Tetrafluorotricyclo[4.2.1.0(2,5)]non-7-ene
• 英文别名: 3,3,4,4-tetrafluorotricyclo[4.2.1.02,5]non-7-ene
• CAS: 6654-42-8
• 化学式: C₉H₈F₄
• 分子量: 192.156
• InChiKey: RKBDIAMXCKXCEJ-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.9
• 重原子数：
  13
• 可旋转键数：
  0
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.78
• 拓扑面积：
  0
• 氢给体数：
  0
• 氢受体数：
  4

反应信息

• 作为产物：
  描述：

  四氟乙烯 、 2,5-降冰片二烯 反应 8.0h， 生成 3,3,4,4-Tetrafluorotricyclo[4.2.1.0(2,5)]non-7-ene
  参考文献：
  名称：

  Design of very transparent fluoropolymer resists for semiconductor manufacture at 157 nm

  摘要：

  Photolithography at 157 nm requires development of new photoresists that are highly transparent at this wavelength. Transparent fluoropolymer platforms have been identified which also possess other materials properties required for chemically amplified imaging and aqueous development. Polymers of tetrafluoroethylene (TFE), a fluoroalcohol-substituted norbomene and an acid-labile acrylate ester show the best combination of properties. A solution, semibatch, free-radical polymerization process was developed allowing synthesis of the terpolymers on a multikilogram scale. Further property enhancements may arise from replacing the norbomene with functionalized tricyclononenes. Formulated resists have been imaged in a 157 nm microstepper. (C) 2003 Elsevier Science B.V. All rights reserved.

  DOI：

  10.1016/s0022-1139(03)00075-7

文献信息

• Photoroesists Comprising Polymers Derived From Fluoroalcohol-Substituted Polycyclic Monomers
  申请人：Crawford Karl Michael

  公开号：US20070207413A1

  公开（公告）日：2007-09-06

  The present invention relates to novel unsaturated polycyclic compounds containing two fluoroalcohol substitutents. This invention also relates to homopolymers and copolymers derived from such unsaturated polycyclic compounds. The copolymers are useful for photoimaging compositions and, in particular, photoresist compositions (positive-working and/or negative-working) for imaging in the production of semiconductor devices. The polymers are especially useful in photoresist compositions having high UV transparency (particularly at short wavelengths, e.g., 157 nm) which are useful as base resins in resists and potentially in many other applications.

  本发明涉及一种新型不饱和多环化合物，其中包含两个氟醇取代基。本发明还涉及从这种不饱和多环化合物衍生出的同聚物和共聚物。这些共聚物可用于光影像组合物，特别是用于制造半导体器件的光阻组合物（正像和/或负像）。这些聚合物在高紫外线透明度（特别是在短波长，例如157nm处）的光阻组合物中特别有用，可用作光阻的基础树脂，潜在地可用于许多其他应用。
• POLYCYCLIC FLUORINE-CONTAINING POLYMERS AND PHOTORESISTS FOR MICROLITHOGRAPHY
  申请人：E. I. du Pont de Nemours and Company

  公开号：EP1383812B1

  公开（公告）日：2006-05-31
• Polycyclic fluorine-containing polymers and photoresists for microlithography
  申请人：——

  公开号：US20040092686A1

  公开（公告）日：2004-05-13

  Polycyclic fluorine-containing polymers and photoresists and associated processes for microlithography in the extreme, far, and near UV are disclosed. The polycyclic fluorine-containing polymer is derived from a repeat unit comprising the polycyclic reaction product of norbomadiene and a fluorolefin. The polymer may also contain a repeat unit derived from one or more additional monomers such as a fluorolefin, specifically tetrafluoroethylene, a fluoroalcohol, or an acrylate.
• US7507522B2
  申请人：——

  公开号：US7507522B2

  公开（公告）日：2009-03-24