Disclosed herein is an improved novel synthetic process for the preparation of Eprosartan, which comprises treating 2-n-butyl-4-formylimidazole of formula (II) with N-protecting group selected from the group consisting of C1-C4 alkyl ester derivative of methacrylic acid; C1 -C4 alkyl ester derivative of crotonic acid; or C1 -C4 alkyl ester derivative of acrylic acid in the presence of a base selected from anion exchange resin or DBU and optionally in presence of a solvent, to get N-protected compound(III) in Stage-I. Stage-II comprises reacting N-protected compound (III) with 2-(2-thienyl methyl) propanedioic acid monoethyl ester to get compound (V). Stage-Ill comprises reacting compound(V) obtained from stage-II with methyl-4-(bromomethyl) benzoate to get compound (VII).Further, simultaneous hydrolysis of ester groups and removal of N-protecting group is accomplished using caustic soda solution, to yield Eprosartan of Formula (I) in Stage-IV. Finally, pharmaceutical acceptable salt of Eprosartan is prepared in Stage-V.
本文披露了一种改进的新型合成过程,用于制备厄普罗沙坦。该过程包括在存在阴离子交换
树脂或
DBU的碱的条件下,将式(II)的2-n-丁基-4-甲酰基
咪唑与从以下组中选择的N保护基进行处理:
甲基丙烯酸酯的C1-C4烷基衍
生物;
巴豆烯酸酯的C1-C4烷基衍
生物;或
丙烯酸酯的C1-C4烷基衍
生物,可选地在溶剂的存在下,获得N保护化合物(III),这是第一阶段。第二阶段包括将第一阶段获得的N保护化合物(III)与2-(2-
噻吩甲基)
丙二酸单乙酯反应,得到化合物(V)。第三阶段包括将从第二阶段得到的化合物(V)与甲基-4-(
溴甲基)
苯甲酸酯反应,得到化合物(VII)。进一步地,使用苛性
钠溶液同时
水解酯基和去除N保护基,以得到式(I)的厄普罗沙坦,这是第四阶段。最后,在第五阶段制备厄普罗沙坦的药用可接受盐。