di(4-t-butylphenyl)iodonium acetate | 185195-27-1

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: di(4-t-butylphenyl)iodonium acetate
• 英文别名: bis(4-(tert-butyl)phenyl)iodonium acetate；bis(p-tert-butylphenyl)iodonium acetate；bis (4-t-butylphenyl iodonium) acetate；di[t-butylphenyl]iodonium acetate；Iodonium, bis[4-(1,1-dimethylethyl)phenyl]-, acetate；bis(4-tert-butylphenyl)iodanium;acetate
• CAS: 185195-27-1
• 化学式: C₂H₃O₂*C₂₀H₂₆I
• 分子量: 452.376
• InChiKey: SZUCEMJQEUTBEW-UHFFFAOYSA-M

计算性质

• 辛醇/水分配系数(LogP)：
  1.17
• 重原子数：
  25
• 可旋转键数：
  4
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.41
• 拓扑面积：
  40.1
• 氢给体数：
  0
• 氢受体数：
  2

反应信息

• 作为反应物：
  描述：

  di(4-t-butylphenyl)iodonium acetate 、 对甲苯磺酸甲酯 在 甲基叔丁基醚 作用下， 以 甲基叔丁基醚 为溶剂， 反应 5.0h， 生成 双(4-叔丁基苯基)碘鎓对甲苯磺酸盐
  参考文献：
  名称：

  Process for producing onium salt derivative and novel onium salt derivative

  摘要：

  该发明提供了一种高产率的方法，用于生产有用于化学放大感光胶中的试剂，例如酸发生剂的离子盐衍生物，并提供新型离子盐衍生物。将含有卤化物阴离子或羧酸盐阴离子的离子盐衍生物与磺酸酯衍生物或磷酸衍生物反应，可高产率地得到离子硫酸盐衍生物或离子磷酸盐衍生物。

  公开号：

  US06620957B1

文献信息

• RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYPHENOLIC COMPOUND FOR USE IN THE COMPOSITION, AND ALCOHOLIC COMPOUND THAT CAN BE DERIVED THEREFROM
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：US20160145231A1

  公开（公告）日：2016-05-26

  A resist composition containing a compound represented by the general formula (1) or (2), a method for forming a resist pattern using the composition, a polyphenolic compound for use in the composition, and an alcoholic compound that can be derived therefrom are described.

  描述了一种包含由通式（1）或（2）表示的化合物的光刻胶组合物，使用该组合物形成光刻胶图案的方法，用于该组合物的多酚化合物，以及可以由其衍生的醇化合物。
• IONIC, ORGANIC PHOTOACID GENERATORS FOR DUV, MUV AND OPTICAL LITHOGRAPHY BASED ON PERACEPTOR-SUBSTITUTED AROMATIC ANIONS
  申请人：Glodde Martin

  公开号：US20090176173A1

  公开（公告）日：2009-07-09

  A photoacid generator compound P + A − , comprises an antenna group P + comprising a cation that generates protons upon interaction with light, and A − comprising a weakly coordinating peracceptor-substituted aromatic anion that does not contain fluorine or semi-metallic elements such as boron. In one embodiment, such anions comprise the following compounds 4, 5, 6 and 7, wherein E comprises an electron-withdrawing group and the removal of one proton generates aromaticity. P + comprises an onium cation that decomposes into a proton and other components upon interaction with photons. P + may comprise an organic chalcogen onium cation or a halonium cation, wherein the chalcogen onium cation in another embodiment may comprises an oxonium, sulfonium, selenium, tellurium, or onium cation, and the halonium cation may comprise an iodonium, chlorine or bromine onium cation. A novel compound comprises TPS CN5. A photolithographic formulation comprises the photoacid generator in combination with a photolithographic composition such as a photolithographic polymer. The formulation, when on a substrate, is exposed to optical lithographic radiation or ArF (193 nm) or KrF (248 nm) radiation, and developed. A product comprises an article of manufacture made by the method of the invention.

  一种光酸产生化合物P+A−，包含一个天线基团P+，该天线基团P+包含一个在光作用下能产生质子的阳离子，以及一个A−基团，该A−基团包含一个弱配位的全受体取代的芳香阴离子，该芳香阴离子不含氟或半金属元素如硼。在一个实施例中，此类阴离子包含以下化合物4、5、6和7，其中E包含一个吸电子基团，移除一个质子产生芳香性。P+包含一个铵盐阳离子，该铵盐阳离子在光子作用下分解成质子和其他组分。P+可以包含一个有机硫族铵盐阳离子或一个卤铵盐阳离子，其中在另一个实施例中，硫族铵盐阳离子可以包含一个氧铵盐、硫铵盐、硒铵盐、碲铵盐或铵盐阳离子，而卤铵盐阳离子可以包含一个碘铵盐、氯铵盐或溴铵盐阳离子。一种新型化合物包含TPS CN5。一种光刻配方包含光酸产生剂与光刻组合物如光刻聚合物的组合。当该配方位于基底上时，它暴露于光学光刻辐射或ArF（193 nm）或KrF（248 nm）辐射，并进行显影。一个产品包含通过本发明方法制造的制品。
• OPTICAL COMPONENT FORMING COMPOSITION AND CURED PRODUCT THEREOF
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：US20200262787A1

  公开（公告）日：2020-08-20

  The present invention provides an optical component forming composition comprising a tellurium-containing compound or a tellurium-containing resin.

  本发明提供了一种包括含碲化合物或含碲树脂的光学元件成型组合物。
• RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, ORGANIC ACID AND ACID GENERATING AGENT
  申请人：MATSUDA Yasuhiko

  公开号：US20130065186A1

  公开（公告）日：2013-03-14

  A radiation-sensitive resin composition includes an acid generating agent to generate an organic acid by irradiation with a radioactive ray. The organic acid has a cyclic hydrocarbon group and an organic group including a bond that is cleavable by an acid or a base to produce a polar group. The organic acid is preferably represented by a following formula (I). Z represents an organic acid group. R 2 represents an alkanediyl group, wherein a part or all of hydrogen atoms of the alkanediyl group represented by R 1 are optionally substituted by a fluorine atom. X represents a single bond, O, OCO, COO, CO, SO 3 or SO 2 . R 2 represents a cyclic hydrocarbon group. R 3 represents a monovalent organic group having a functional group represented by a following formula (x). n is an integer of 1 to 3. Z—R 1 —X—R 2 —(R 3 ) n (I) —R 31 -G-R 13 (x)

  一种辐射敏感树脂组合物包括酸发生剂，通过放射性射线照射生成有机酸。该有机酸具有环烃基和有机基，包括可被酸或碱裂解以产生极性基团的键。有机酸最好由以下式（I）表示。其中，Z代表有机酸基团。R2代表脂肪二元基，其中R1代表脂肪二元基中的一部分或全部氢原子可选地被氟原子取代。X代表单键，O，OCO，COO，CO，SO3或SO2。R2代表环烃基。R3代表具有以下式（x）所表示的官能团的一价有机基。n为1到3的整数。Z-R1-X-R2-(R3)n（I）-R31-G-R13（x）。
• RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING A RESIST PATTERN AND SULFONIUM COMPOUND
  申请人：SATO Mitsuo

  公开号：US20130045446A1

  公开（公告）日：2013-02-21

  A radiation-sensitive resin composition includes a sulfonium compound represented by a general formula (1), and a first polymer that serves as a base resin. R represents a group represented by a general formula (2). n 1 to n 3 each independently represent an integer of 0 to 5 and n 1 +n 2 +n 3 ≧1. X − represents an anion. The sulfonium compound is preferably a compound represented by a following general formula (1-1).

  一种辐射敏感的树脂组合物，包括一种由通式（1）表示的磺酸盐化合物和作为基础树脂的第一聚合物。其中，R代表由通式（2）表示的基团，n1到n3各自独立地表示0到5的整数，且n1+n2+n3≥1。X-表示阴离子。最好的磺酸盐化合物是由下列通式（1-1）表示的化合物。