Highly selective tetrahydropyranylation/dehydropyranylation of alcohols and phenols using porous phenolsulfonic acid-formaldehyde resin catalyst under solvent-free condition
solvent-free chemoselective tetrahydropyranylation/depyranylation of alcohols and phenols is reported herein using mesoporous Phenolsulfonic Acid Formaldehyde Resins as a heterogeneous acidcatalyst. The catalyst successfully performed chemoselective protection and deprotection reactions of a wide range of substrates ranging from primary to secondary and tertiary alcohols and also phenols. The reactions were
HETEROCYCLIC COMPOUND AND MEDICINAL APPLICATION THEREOF
申请人:Japan Tobacco, Inc.
公开号:EP1953147A1
公开(公告)日:2008-08-06
The present invention aims at providing a novel heterocyclic compound having HCV entry inhibitory activity and the pharmaceutical use thereof. The present invention provides a therapeutic agent for hepatitis C comprising a heterocyclic compound represented by the following formula [1] or a pharmaceutically acceptable salt thereof as an active ingredient:
wherein Q1 is -N=, etc., Q2 is -N-, etc., Q3 is -N=, etc., Q4 is -N-, etc., Q5 is -N-, etc., R1 is a hydrogen atom, etc., R2 is a hydrogen atom, etc., ring A is a monocyclic aryl group optionally having substituent(s), etc., and ring B is a monocyclic aryl group optionally having substituent(s), etc.
Optically active compounds and a process for producing these compounds
申请人:CHISSO CORPORATION
公开号:EP0372891A2
公开(公告)日:1990-06-13
The invention provides optically active compounds which are starting materials of physiologically active substances, functional materials and the which which compounds have the formula:
R²---CH₂-OX (I)
wherein R¹ is a hydrogen atom or a C₁-C₂₀ group; R² is a C₁-C₄₀ alkyl, C₂-C₄₀ alkenyl or C₂-C₄₀ alkynyl group, which may be substituted or interrupted by one or more of substituted or unsubstituted phenyl, cyclohexyl, pyridyl, pyrimidyl, pyridazyl, pyrazyl, dioxyl or bicyclooctyl groups, or by one or more of cyanogen groups or halogen, oxygen, nitrogen, silicon or sulphur atoms; X is a chemically removable protective group; and C* is an asymmetric carbon atom.