anthrione | 75150-37-7

• 分子结构分类: 有机化合物 - 苯类化合物 - 蒽
• 英文名称: anthrione
• 英文别名: 10H-anthracene-9-thione；10H-Anthracen-9-thion；9-Thion-dihydroanthracen；Thioanthron；10H-Anthracene-9-thione
• CAS: 75150-37-7
• 化学式: C₁₄H₁₀S
• 分子量: 210.299
• InChiKey: IIVXOEXOFOWDGP-UHFFFAOYSA-N

物化性质

• 沸点：
  349.9±45.0 °C(Predicted)
• 密度：
  1.24±0.1 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  4.3
• 重原子数：
  15
• 可旋转键数：
  0
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.07
• 拓扑面积：
  32.1
• 氢给体数：
  0
• 氢受体数：
  1

反应信息

• 作为反应物：
  描述：

  anthrione 、 (3-Chloro-benzylidene)-triphenyl-λ⁵-arsane 以 甲醇 为溶剂， 反应 6.0h， 生成 10-[(3-chlorophenyl)methylidene]-9H-anthracene
  参考文献：
  名称：

  Tewari, R. S.; Suri, S. K.; Gupta, K. C., Zeitschrift fur Naturforschung, Teil B: Anorganische Chemie, Organische Chemie, 1980, vol. 35, # 1, p. 95 - 98

  摘要：

  DOI：
• 作为产物：
  描述：

  9,10-二溴蒽 在 sodium hydroxide 、 sodium polysulfide 、 异戊醇 、 溶剂黄146 、 锌 作用下， 生成 anthrione
  参考文献：
  名称：

  Cooke; Heilbron; Walker, Journal of the Chemical Society, 1925, vol. 127, p. 2253

  摘要：

  DOI：

文献信息

• Smiles; Gibson, Journal of the Chemical Society, 1924, vol. 125, p. 181
  作者：Smiles、Gibson

  DOI：——

  日期：——
• DE360608
  申请人：——

  公开号：——

  公开（公告）日：——
• Friedlaender; Simon, Chemische Berichte, 1922, vol. 55, p. 3972
  作者：Friedlaender、Simon

  DOI：——

  日期：——
• SPIRO-CONTAINING COMPOUNDS AND COMPOSITIONS AS MODULATORS OF STEROID HORMONE NUCLEAR RECEPTORS
  申请人：Michellys Pierre-Yves

  公开号：US20090124597A1

  公开（公告）日：2009-05-14

  Described herein are compounds that have a spiro structural feature. Also described herein are methods for making such compounds, methods for using such compounds to modulate the activity of steroid hormone nuclear receptors, and pharmaceutical compositions and medicaments comprising such compounds. Also described herein are methods of using such compounds, pharmaceutical compositions and medicaments to treat and/or prevent diseases or conditions associated with the activity of steroid hormone nuclear receptors.
• PHENOL MONOMER, POLYMER FOR FORMING A RESIST UNDERLAYER FILM INCLUDING SAME, AND COMPOSITION FOR A RESIST UNDERLAYER FILM INCLUDING SAME
  申请人：DONGJIN SEMICHEM CO., LTD

  公开号：US20140319097A1

  公开（公告）日：2014-10-30

  A phenolic monomer used in the lithographic process for semiconductor fabrication, a polymer for preparing a resist under-layer comprising the same, and a resist under-layer composition comprising the same, are disclosed. The phenolic monomer is represented by the formula 1 of the specification, in Formula 1, R1, R2, R3, and R4 are independently a hydrogen atom, or a straight-chain, branched, monocyclic or polycyclic saturated or unsaturated hydrocarbon group having 1 to 20 carbon atoms with or without a hetero atom; A is a monocyclic or polycyclic aromatic hydrocarbon group having 4 to 20 carbon atoms; X is an oxygen atom (O) or a sulfur atom (S); and Y is a single bond, a methylene group (—CH2-), an oxygen atom (O), a sulfur atom (S), an amino group (—NH—), or two isolated hydrogen atoms, wherein A, R1, R2, R3, and R4 can be substituted with a straight-chain, branched, monocyclic or polycyclic saturated or unsaturated hydrocarbon group having 1 to 20 carbon atoms with or without a hetero atom; and either R1 and R2 or R3 and R4 are independently linked to each other to form a ring.