申请人:Matsumoto Akira
公开号:US20080286693A1
公开(公告)日:2008-11-20
Chemically amplified photoresist compositions comprising,
(a) a compound which cures upon the action of an acid or a compound whose solubility is increased upon the action of an acid; and
(b) a compound of the formula Ia, Ib, IIa, IIb, IIIa, IIIb, IVa, IVb, Va, Vb or VIa
wherein n is 1 or 2; m is 0 or 1; X
0
is —[CH
2
]
h
—X or —CH═CH
2
; h is 2, 3, 4, 5 or 6; R
1
, when n is 1, is for example optionally substituted phenyl, naphthyl, anthracyl, phenanthryl, or heteroaryl; R
1
, when n is 2, is for example optionally substituted phenylene or naphthylene; R
2
for example has one of the meanings of R
1
; X is for example —OR
20
, —NR
21
R
22
, —SR
23
; X′ is —X
1
-A
3
-X-; X
1
and X
2
are for example —O—, —S— or a direct bond; A
3
is e.g. phenylene; R
3
has for example one of the meanings given for R
1
; R
4
has for example one of the meaning given for R
2
; R
5
and R
6
e.g. are hydrogen; G i.a. is —S— or —O—; R
7
when n is 1, e.g. is phenyl, optionally substituted, when n is 2, is for example phenylene; R
8
and R
9
e.g. are C
1
-C
18
alkyl; R
10
has one of the meanings given for R
7
; R
11
i.a. is C
1
-C
18
alkyl; R
12
, R
13
, R
14
, R
15
R
16
, R
17
and R
18
for example are hydrogen or C
1
-C
18
alkyl; R
20
, R
21
, R
22
and R
23
i.a. are phenyl or C
1
-C
18
alkyl; give high resolution with good resist profile.
化学增感光阻剂组合物包括:(a)一种在酸的作用下固化的化合物或一种在酸的作用下溶解度增加的化合物;以及(b)式Ia、Ib、IIa、IIb、IIIa、IIIb、IVa、IVb、Va、Vb或VIa中的一种化合物,其中n为1或2;m为0或1;X0为—[ ]h—X或—CH═
CH2;h为2、3、4、5或6;当n为1时,R1例如为可选取代的苯基、
萘基、
蒽基、
菲基或杂环芳基;当n为2时,R1例如为可选取代的苯基或
萘基;R2例如具有R1的一种含义;X例如为—OR20、—NR21
R22、—SR23;X′为—X1-A3-X-;X1和X2例如为—O—、—S—或直接键;A3例如为苯基;R3例如具有R1给出的一种含义;R4例如具有R2给出的一种含义;R5和R6例如为氢;G例如为—S—或—O—;当n为1时,R7例如为可选取代的苯基,当n为2时,例如为苯基;R8和R9例如为C1-C18烷基;R10具有R7给出的一种含义;R11例如为C1-C18烷基;R12、R13、R14、R15、R16、R17和R18例如为氢或C1-C18烷基;R20、R21、
R22和R23例如为苯基或C1-C18烷基;具有良好的抗蚀性能和高分辨率。