The present invention provides a polishing composition having excellent storage stability. The present invention relates to a polishing composition including abrasive grains and an oxidant containing a halogen atom, a value (A/B) obtained by dividing the total number (A) (unit: number) of silanol groups contained in the abrasive grains in the polishing composition by a concentration (B) (unit: % by mass) of the oxidant in the polishing composition being 8 × 1023 or less.
本发明提供了一种具有优异储存稳定性的抛光组合物。本发明涉及一种抛光组合物,其中包括研磨粒和含有卤素原子的氧化剂,将抛光组合物中研磨粒所含
硅烷醇基团的总数(A)(单位:个)除以抛光组合物中氧化剂的浓度(B)(单位:质量百分比)得到的值(A/B)为 8 × 1023 或以下。