The present invention provides a polishing composition having excellent storage stability. The present invention relates to a polishing composition including abrasive grains and an oxidant containing a halogen atom, a value (A/B) obtained by dividing the total number (A) (unit: number) of silanol groups contained in the abrasive grains in the polishing composition by a concentration (B) (unit: % by mass) of the oxidant in the polishing composition being 8 × 1023 or less.
�ber Umsetzungen des ?-Keto-adipins�ure-esters; Synthese von Stickstoff-Heterocyclen, insbesondere Pyrrolonen undd,l-Ecgonins�ure. (50. Mitteilung �ber Stickstoff-Heterocyclen)
作者:Paul Ruggli、Arthur Maeder
DOI:10.1002/hlca.19420250517
日期:1942.8.1
Synthesis of Ecgoninic Acid and Related Pyrrolidones
作者:G. L. Evans、H. W. Gray、H. W. Jacobson
DOI:10.1021/ja01162a104
日期:1950.6
Willstaetter; Bode, Chemische Berichte, 1901, vol. 34, p. 520
作者:Willstaetter、Bode
DOI:——
日期:——
Liebermann, Chemische Berichte, 1891, vol. 24, p. 612