Triethylsilyl cation | 44564-80-9

• 分子结构分类: 有机化合物 - 碳氢化合物衍生物
• 英文名称: Triethylsilyl cation
• 英文别名: triethylsilane；TESi；Triethylsilanylium
• CAS: 44564-80-9
• 化学式: C₆H₁₅Si
• 分子量: 115.271
• InChiKey: CXKQHHJKHZXXPZ-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.54
• 重原子数：
  7
• 可旋转键数：
  3
• 环数：
  0.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  0
• 氢给体数：
  0
• 氢受体数：
  0

反应信息

• 作为产物：
  描述：

  tetraethyl silane cation 128.9 ℃ 、0.0 Pa 条件下， 生成 乙烷 、 Triethylsilyl cation
  参考文献：
  名称：

  Zero-Pressure Thermal-Radiation-Induced Dissociation of Tetraethylsilane Cation

  摘要：

  Zero-pressure thermal-radiation-induced dissociation (ZTRID) of tetraethylsilane cation is reported. Dissociation of weakly bound gas-phase cluster ions by the blackbody background radiation field has been shown previously to proceed at an observable rate; the present results represent the first characterization of this process for a covalently bound molecular ion. Thermal-radiation-induced dissociation of the ions was studied at the low-pressure limit in a FT-ICR mass spectromer, and cleavage of the ethyl group from silicon was observed on a time scale of seconds, with the rate being strongly temperature dependent. The activation energy for the loss of one ethyl radical from tetraethylsilane cation was derived from the slope of the Arrhenius plot in the 340-400 K temperature range to be 0.43 +/- 0.07 eV. The bond energy (0 K) was determined to be 0.70 +/- 0.07 eV using thermal dissociation theory and 0.71 +/- 0.07 eV using master-equation modeling. A bond energy of 0.78 eV was assigned at 298 K, and a heat of formation (298 K) of 131.7 kcal mol(-1) was derived for the triethylsilyl cation.

  DOI：

  10.1021/jp952109c
• 作为试剂：
  描述：

  11-tritylsulfanyl-undecanoic acid 2-[2-(2-{2-[2-(2-hydroxy-ethoxy)-ethoxy]-ethoxy}-ethoxy)-ethoxy]-ethyl ester 在 Triethylsilyl cation 、 三氟乙酸 作用下， 以 二氯甲烷 为溶剂， 反应 4.0h， 以60%的产率得到2-[2-(2-{2-[2-(2-hydroxy-ethoxy)-ethoxy]-ethoxy}-ethoxy)-ethoxy]-ethyl ester
  参考文献：
  名称：

  Liu, Dingbin; Xie, Yunyan; Shao, Huawu, Angewandte Chemie - International Edition, 2009, vol. 48, p. 4406 - 4408

  摘要：

  DOI：

文献信息

• Kinetics of hydride-transfer reactions from hydrosilanes to carbenium ions. Substituent effects in silicenium ions
  作者：Herbert Mayr、Nils Basso、Gisela Hagen

  DOI：10.1021/ja00034a044

  日期：1992.4

  varying substitution to para-substituted diarylcarbenium ions have been measured in dichloromethane solution. Generally the reactions follow a second-order rate law, -d[Ar 2 CH + ]/dt=k 2 [Ar 2 CH + ] [HSiR 1 R 2 R 3 ], and k 2 is independent of the degree of ion-pairing and the nature of the counterion (exceptions are reported). The reaction rates are almost independent of solvent polarity

  已经在二氯甲烷溶液中测量了氢化物从具有广泛变化的取代基的氢硅烷 HSiR 1 R 2 R 3 到对位取代的二芳基碳鎓离子的转移速率。通常反应遵循二阶速率定律，-d[Ar 2 CH + ]/dt=k 2 [Ar 2 CH + ] [HSiR 1 R 2 R 3 ]，k 2 与离子的程度无关-配对和反离子的性质（报告了例外情况）。反应速率几乎与溶剂极性无关
• Kinetic hydricity of silane hydrides in the gas phase
  作者：Jiahui Xu、Allison E. Krajewski、Yijie Niu、G. S. M. Kiruba、Jeehiun K. Lee

  DOI：10.1039/c9sc02118c

  日期：——

  Herein, gas phase studies of the kinetic hydricity of a series of silane hydrides are described. An understanding of hydricity is important as hydride reactions figure largely in many processes, including organic synthesis, photoelectrocatalysis, and hydrogen activation. We find that hydricity trends in the gas phase differ from those in solution, revealing the effect of solvent. Calculations and further

  在此，描述了一系列硅烷氢化物的动力学水合的气相研究。由于在许多过程中，包括有机合成，光电催化和氢活化在内的许多过程中，氢化物反应都非常重要，因此了解水合性非常重要。我们发现气相中的水合趋势与溶液中的水合趋势不同，从而揭示了溶剂的作用。计算和进一步的实验，包括H / D研究，被用来研究反应物的反应性和结构。这些研究也代表了在没有溶剂的情况下系统地了解亲核性和亲电性的第一步。
• Zero-Pressure Thermal-Radiation-Induced Dissociation of Tetraethylsilane Cation
  作者：Chuan-Yuan Lin、Robert C. Dunbar

  DOI：10.1021/jp952109c

  日期：1996.1.1

  Zero-pressure thermal-radiation-induced dissociation (ZTRID) of tetraethylsilane cation is reported. Dissociation of weakly bound gas-phase cluster ions by the blackbody background radiation field has been shown previously to proceed at an observable rate; the present results represent the first characterization of this process for a covalently bound molecular ion. Thermal-radiation-induced dissociation of the ions was studied at the low-pressure limit in a FT-ICR mass spectromer, and cleavage of the ethyl group from silicon was observed on a time scale of seconds, with the rate being strongly temperature dependent. The activation energy for the loss of one ethyl radical from tetraethylsilane cation was derived from the slope of the Arrhenius plot in the 340-400 K temperature range to be 0.43 +/- 0.07 eV. The bond energy (0 K) was determined to be 0.70 +/- 0.07 eV using thermal dissociation theory and 0.71 +/- 0.07 eV using master-equation modeling. A bond energy of 0.78 eV was assigned at 298 K, and a heat of formation (298 K) of 131.7 kcal mol(-1) was derived for the triethylsilyl cation.