申请人:Imperial Chemical Industries PLC
公开号:US04866078A1
公开(公告)日:1989-09-12
A compound of formula (I) ##STR1## wherein R.sup.1, R.sup.2, R.sup.4 and R.sup.5 are independently selected from hydrogen, halogen, lower alkyl optionally substituted by halogen, lower alkoxy optionally substituted by halogen and lower alkenyl optionally substituted by halogen; R.sup.3 is halogen, amino, mono- or di(lower alkyl)-amino, lower alkyl substituted by halogen, lower alkoxy optionally substituted by halogen and lower alkenyl optionally substituted by halogen provided that R.sup.3 is not monochloro or monobromo-methyl; R.sup.6 is oxygen or sulphur; R.sup.7 and R.sup.10 are independently selected from hydrogen, halogen, lower alkyl optionally substituted by halogen, lower alkoxy optionally substituted by halogen, and lower thioalkoxy optionally substituted by halogen; and R.sup.8 is hydrogen, halogen, optionally substituted lower alkyl, optionally substituted lower alkoxy, optionally substituted lower thioalkoxy, cyano, nitro, optionally substituted oximino, optionally substituted lower alkenyl, optionally substituted aryloxy, optionally substituted amino or S(O)nR.sup.11 wherein n is 0, 1 or 2 and R.sup.11 is optionally substituted lower alkyl; R.sup.9 is hydrogen, or lower alkyl optionally substituted by halogen, lower alkenyl optionally substituted by halogen or CO.sub.2 R.sup.12 wherein R.sup.12 is lower alkyl optionally substituted by halogen; provided that R.sup.1, R.sup.2, R.sup.3, R.sup.4 and R.sup.5 are not all hydrogen; and further provided that when R.sup.3 is trifluoromethyl and R.sup.1 and R.sup.5 are halogen, R.sup.2 and R.sup.4 are not both hydrogen, or R.sup.7, R.sup.8, R.sup.9 and R.sup.10 do not comprise from one to four halogen or trihalomethyl substituents.
式(I)的化合物##STR1##其中R.sup.1、R.sup.2、R.sup.4和R.sup.5分别独立地选择自氢、卤素、可选地被卤素取代的较低烷基、可选地被卤素取代的较低烷氧基和可选地被卤素取代的较低烯基;R.sup.3是卤素、氨基、单或双(较低烷基)-氨基、可选地被卤素取代的较低烷基、可选地被卤素取代的较低烷氧基和可选地被卤素取代的较低烯基,前提是R.sup.3不是单氯甲基或单溴甲基;R.sup.6是氧或硫;R.sup.7和R.sup.10分别独立地选择自氢、卤素、可选地被卤素取代的较低烷基、可选地被卤素取代的较低烷氧基和可选地被卤素取代的较低硫代烷氧基;R.sup.8是氢、卤素、可选地被取代的较低烷基、可选地被取代的较低烷氧基、可选地被取代的较低硫代烷氧基、氰基、硝基、可选地被取代的肟基、可选地被取代的较低烯基、可选地被取代的芳基氧基、可选地被取代的氨基或S(O)nR.sup.11,其中n为0、1或2,R.sup.11是可选地被取代的较低烷基;R.sup.9是氢,或可选地被卤素取代的较低烷基、可选地被卤素取代的较低烯基或CO.sub.2R.sup.12,其中R.sup.12是可选地被卤素取代的较低烷基;前提是R.sup.1、R.sup.2、R.sup.3、R.sup.4和R.sup.5不全为氢;进一步前提是当R.sup.3为三氟甲基且R.sup.1和R.sup.5为卤素时,R.sup.2和R.sup.4不全为氢,或R.sup.7、R.sup.8、R.sup.9和R.sup.10不包含一到四个卤素或三卤甲基取代基。