1-[fluoro-bis(trimethylsilyl)methyl]-4-fluorobenzene | 1355722-50-7

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: 1-[fluoro-bis(trimethylsilyl)methyl]-4-fluorobenzene
• 英文别名: [Fluoro-(4-fluorophenyl)-trimethylsilylmethyl]-trimethylsilane；[fluoro-(4-fluorophenyl)-trimethylsilylmethyl]-trimethylsilane
• CAS: 1355722-50-7
• 化学式: C₁₃H₂₂F₂Si₂
• 分子量: 272.485
• InChiKey: OVOXAQRCWYJSEH-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  4.75
• 重原子数：
  17
• 可旋转键数：
  3
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.54
• 拓扑面积：
  0
• 氢给体数：
  0
• 氢受体数：
  2

反应信息

• 作为产物：
  描述：

  三甲基氯硅烷 、 4-氟三氟甲苯 在 Cu-Mg 作用下， 以 地昔帕明 为溶剂， 反应 15.0h， 以85%的产率得到[difluoro-(4-fluorophenyl)methyl]trimethylsilane
  参考文献：
  名称：

  Cu-deposits on Mg metal surfaces promote electron transfer reactions

  摘要：

  The enhancement of the electron transfer processes in the Grignard reagent formation-type ring silylation and the defluorination-silylation of perfluoroalkyl benzenes by Cu(0)-deposited Mg metal were confirmed. Microscopic analysis and substituent effects implied a different reduction process in the presence of Cu-deposited Mg metal than in the presence of bare Mg metal. (C) 2011 Elsevier Ltd. All rights reserved.

  DOI：

  10.1016/j.tet.2011.11.082

文献信息

• Cu-deposits on Mg metal surfaces promote electron transfer reactions
  作者：Shinya Utsumi、Toshimasa Katagiri、Kenji Uneyama

  DOI：10.1016/j.tet.2011.11.082

  日期：2012.1

  The enhancement of the electron transfer processes in the Grignard reagent formation-type ring silylation and the defluorination-silylation of perfluoroalkyl benzenes by Cu(0)-deposited Mg metal were confirmed. Microscopic analysis and substituent effects implied a different reduction process in the presence of Cu-deposited Mg metal than in the presence of bare Mg metal. (C) 2011 Elsevier Ltd. All rights reserved.