[3,3,5,5-Tetrafluoro-2-hydroxy-6-methyl-2,6-bis(trifluoromethyl)oxan-4-yl] 2-methylprop-2-enoate | 885121-70-0

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 氧烷类
• 英文名称: [3,3,5,5-Tetrafluoro-2-hydroxy-6-methyl-2,6-bis(trifluoromethyl)oxan-4-yl] 2-methylprop-2-enoate
• CAS: 885121-70-0
• 化学式: C₁₂H₁₀F₁₀O₄
• 分子量: 408.193
• InChiKey: LVFBGAHVZCVPCK-UHFFFAOYSA-N

物化性质

• 沸点：
  264.6±40.0 °C(Predicted)
• 密度：
  1.54±0.1 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  3.9
• 重原子数：
  26
• 可旋转键数：
  3
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.75
• 拓扑面积：
  55.8
• 氢给体数：
  1
• 氢受体数：
  14

反应信息

• 作为反应物：
  描述：

  [3,3,5,5-Tetrafluoro-2-hydroxy-6-methyl-2,6-bis(trifluoromethyl)oxan-4-yl] 2-methylprop-2-enoate 、 氯甲基甲基醚 在 三乙胺 、 sodium iodide 作用下， 以 乙腈 为溶剂， 反应 16.0h， 以95%的产率得到[3,3,5,5-Tetrafluoro-2-(methoxymethoxy)-6-methyl-2,6-bis(trifluoromethyl)oxan-4-yl] 2-methylprop-2-enoate
  参考文献：
  名称：

  Fluorinated monomer of cyclic acetal structure, polymer, resist protective coating composition, resist composition, and patterning process

  摘要：

  具有环状缩醛结构的氟化单体具有以下式子（1），其中R是C1-C20烷基，可以被卤素取代或由氧或羰基分离，Z是双价有机基团，与烷氧形成环，并且包含可聚合的不饱和基团。从氟化单体衍生的聚合物可以赋予适当的防水性、水滑性、亲脂性、酸敏性和水解性，并且在制备保护涂料组合物和抗性组合物时有用。

  公开号：

  US08933251B2
• 作为产物：
  描述：

  3,3,5,5-Tetrafluoro-6-methyl-2,6-bis(trifluoromethyl)oxane-2,4-diol 、 甲基丙烯酰氯 在 三乙胺 作用下， 以 四氢呋喃 为溶剂， 反应 24.5h， 以67%的产率得到[3,3,5,5-Tetrafluoro-2-hydroxy-6-methyl-2,6-bis(trifluoromethyl)oxan-4-yl] 2-methylprop-2-enoate
  参考文献：
  名称：

  Polymerizable fluorinated compound, making method, polymer, resist composition and patterning process

  摘要：

  公开号：

  EP1652846B1

文献信息

• POLYMERIZABLE MONOMER, POLYMER COMPOUND FOR CONDUCTIVE POLYMER, AND METHOD FOR PRODUCING THE POLYMER COMPOUND
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20200247926A1

  公开（公告）日：2020-08-06

  Polymerization reaction is performed using a polymerizable monomer shown by the following general formula (1) and at least one monomer selected from monomers each having a structure of a salt among a lithium salt, a sodium salt, a potassium salt, and a nitrogen compound salt of a fluorosulfonic acid or the like; then, the structure of the salt of the repeating unit of a polymer obtained by the polymerization reaction is changed to the fluorosulfonic acid or the like by ion exchange. Thus, the present invention provides a polymer compound for a conductive polymer and a method for producing the polymer compound which is suitably used as a dopant for a fuel cell and a conductive material, and which is a copolymer containing a repeating unit of styrene having a 3,3,3-trifluoro-2-hydroxy-2-trifluoromethylisobutyl ether group, and a repeating unit having any of a fluorosulfonic acid, a fluorosulfonimide group, and a n-carbonyl-fluoro-sulfonamide group.

  聚合反应使用以下一般式（1）所示的可聚合单体和至少一种选择自锂盐、钠盐、钾盐和氟磺酸盐等盐结构的单体中的单体进行；然后，通过离子交换将聚合反应得到的聚合物的重复单元的盐结构改变为氟磺酸盐或类似物。因此，本发明提供了一种用作导电聚合物的聚合物化合物以及用作燃料电池和导电材料的掺杂剂的聚合物化合物的生产方法，该聚合物是含有3,3,3-三氟-2-羟基-2-三氟甲基异丁基醚基的苯乙烯重复单元和具有氟磺酸、氟磺酰亚胺基团和n-羰基-氟磺酰胺基团中的任何一种的重复单元的共聚物。
• MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20140045123A1

  公开（公告）日：2014-02-13

  A polymer comprising recurring units derived from a (meth)acrylate monomer of tertiary ester type having branched alkyl on alicycle is used to form a resist composition. When subjected to exposure, PEB and organic solvent development, the resist composition is improved in dissolution contrast.

  一种聚合物，包括由具有支链烷基的萜酸酯单体衍生的重复单元，用于形成抗蚀组合物。在经过曝光、PEB和有机溶剂显影处理后，抗蚀组合物在溶解对比度方面得到改善。
• RESIST COMPOSITION, PATTERNING PROCESS, AND BARIUM, CESIUM AND CERIUM SALTS
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20170115566A1

  公开（公告）日：2017-04-27

  A resist composition comprising a base resin comprising acid labile group-containing recurring units and preferably acid generator-containing recurring units, and a sodium, magnesium, potassium, calcium, rubidium, strontium, yttrium, cesium, barium or cerium salt of α-fluorinated sulfonic acid bonded to an alkyl, alkenyl, alkynyl or aryl group exhibits a high resolution and sensitivity and forms a pattern of satisfactory profile with minimal LWR after exposure and development.

  一种抗蚀组合物包括基树脂，其中包含含酸敏感基团的重复单元，最好包含含酸发生剂的重复单元，以及与烷基、烯基、炔基或芳基结合的α-氟磺酸的钠、镁、钾、钙、铷、锶、钇、铯、钡或铈盐，表现出高分辨率和灵敏度，并在曝光和显影后形成具有最小LWR的满意轮廓图案。
• Polymerizable compound, polymer, positive resist composition, and patterning process using the same
  申请人：Hatakeyama Jun

  公开号：US20090297979A1

  公开（公告）日：2009-12-03

  The present invention provides; a polymer suitable as a base resin for a positive resist composition, in particular a chemically amplified positive resist composition, having a higher resolution, a larger exposure allowance, a smaller sparse-dense size difference, a better process applicability, a better pattern configuration after exposure, and in addition, a further excellent etching resistance, than a conventional positive resist; a positive resist composition using the same; a patterning process; and a novel polymerizable compound to obtain a polymer like this. The present invention was accomplished by a polymer whose hydrogen atom of at least a carboxyl group is substituted by an acid labile group represented by the following general formula (2), a positive resist composition using the same, a patterning process, and a novel polymerizable compound to obtain a polymer like this.

  本发明提供了一种聚合物，适用于作为正向光刻胶组成的基础树脂，特别是化学放大正向光刻胶组成，具有更高的分辨率、更大的曝光容差、更小的稀密差异、更好的工艺适用性、曝光后更好的图案构形，以及比传统正向光刻胶更出色的蚀刻抗性；使用该聚合物的正向光刻胶组成；一种图案化工艺；以及一种新型的可聚合化合物，以获得类似的聚合物。本发明通过一种聚合物实现，其至少一个羧基的氢原子被下述通式（2）所表示的酸敏感基团所取代，使用该聚合物的正向光刻胶组成，一种图案化工艺，以及一种新型的可聚合化合物，以获得类似的聚合物。
• NITROGEN-CONTAINING MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS
  申请人：Sagehashi Masayoshi

  公开号：US20120183904A1

  公开（公告）日：2012-07-19

  A chemically amplified positive resist composition of better performance can be formulated using a polymer having a quencher incorporated therein, specifically a polymer comprising recurring units having a carbamate structure which is decomposed with an acid to generate an amino group and optionally recurring units having an acid labile group capable of generating a carboxyl and/or hydroxyl group under the action of an acid. The polymer is highly effective for suppressing diffusion of acid and diffuses little itself, and the composition forms a pattern of rectangular profile at a high resolution.

  一种化学增感正向光阻组合物可以使用具有淬灭剂的聚合物制备，具体来说，该聚合物包含具有碳酸酯结构的重复单元，该碳酸酯结构在酸的作用下分解生成氨基团，并且可以包含具有酸敏感基团的重复单元，该酸敏感基团在酸的作用下能够生成羧基和/或羟基团。该聚合物对于抑制酸的扩散非常有效，并且本身扩散很少，组合物形成高分辨率的矩形剖面图案。