摘要:
The elementary reactions of NH(a(1)DELTA,upsilon" = 0,1) with N2 and Xe have been studied in the gas phase. NH(a,upsilon") was produced by laser photolysis of HN3 at lambda(L) = 248 nm and lambda(L) = 308 nm and detected directly by laser-induced fluorescence (LIF) via the (c(1)PI-a(1)DELTA) transition. Time resolution is based on the delay between the photolysis and the probe laser. The reaction rates were determined under pseudo-first-order conditions ([N2] >> [NH(a,upsilon")]0), at different temperatures in the range 290 less-than-or-equal-to T/K less-than-or-equal-to 515. The temperature dependence of the reaction rates, described by an Arrhenius expression, are given by the following: NH(a,upsilon" = 0) + N2 --> products (1),k1 = (3.9 +/- 1.2) x 10(11) exp(-(5.4 +/- 1.2) kJ mol-1/RT) cm3/(mol s); NH(a,upsilon" = 1) + N2 --> products (2),k2 = (8.6 +/- 2.7) x 10(11) exp(-(4.4 +/- 2.3) kJ mol-1/RT) cm3/(mol s); ND(a,upsilon" = 0) + N2 --> products (3),k3 = (4.7 +/- 1.7) x 10(11) exp(-(5.2 +/- 1.1) kJ mol-1/RT) cm3/(mol s). The NH(X,upsilon), which appeared as the product of physical quenching, was detected by LIF with the transition (A(3)PI-X(3)SIGMA-). In the reactions 1, 2, and 3 NH(X) and ND(X), respectively, were formed only in the vibrational ground state. The rate constant for the process NH(a,upsilon") = 1) + Xe --> products (5) was determined to be k5 = (7.7 +/- 0.9) x 10(12) cm3/(mol s). In the physical quenching of NH(a,upsilon") (produced at lambda(L) = 248 nm) by Xe vibrationally excited NH in the electronic ground state NH(X,upsilon = 0,1,2) was detected. NH(a,upsilon" = 0) (produced a lambda(L) = 308 nm) was quenched to NH(X,upsilon = 0). The different quenching dynamics of NH(a,upsilon") by N2 and Xe are discussed.