1,1,1,2,2,3,3-Heptafluoroheptane | 152076-35-2

• 分子结构分类: 有机化合物 - 有机卤素化合物 - 有机氟化物
• 英文名称: 1,1,1,2,2,3,3-Heptafluoroheptane
• CAS: 152076-35-2
• 化学式: C₇H₉F₇
• 分子量: 226.13
• InChiKey: YHNUMBKYLJWTIO-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  4.5
• 重原子数：
  14
• 可旋转键数：
  4
• 环数：
  0.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  0
• 氢给体数：
  0
• 氢受体数：
  7

文献信息

• Method for manufacturing structure having recessed pattern, resin composition, method for forming electroconductive film, electronic circuit, and electronic device
  申请人：JSR CORPORATION

  公开号：US10392699B2

  公开（公告）日：2019-08-27

  The present invention relates to: a method of producing a structure having a recessed pattern; a resin composition; a method of forming an electroconductive film; an electronic circuit; and an electronic device. The method of producing a structure having a recessed pattern includes the following steps (i) and (ii), and the recessed pattern has a film thickness that is thinner by 5% to less than 90% with respect to that of a coating film obtained in the step (i): (i) the step of forming a coating film on a non-flat surface of a structure using a resin composition which includes an acid-dissociable group-containing polymer and an acid generator; and (ii) the step of forming a recess by subjecting a prescribed part of a portion of the coating film to irradiation with radiation.

  本发明涉及：一种生产具有凹陷图案的结构的方法；一种树脂组合物；一种形成导电薄膜的方法；一种电子电路；以及一种电子设备。生产具有凹陷图案的结构的方法包括以下步骤(i)和(ii)，凹陷图案的薄膜厚度比步骤(i)中获得的涂膜薄 5%至小于 90%： (i) 使用树脂组合物在结构的非平面上形成涂膜的步骤，该树脂组合物包括含酸可分解基团的聚合物和酸生成物；以及 (ii) 通过对涂膜部分的规定部分进行辐射形成凹槽的步骤。
• FINE-CELLED PLASTIC FOAM CONTAINING HALOGENATED BLOWING AGENT
  申请人：MINNESOTA MINING AND MANUFACTURING COMPANY

  公开号：EP0606252A1

  公开（公告）日：1994-07-20
• METHOD FOR MANUFACTURING STRUCTURE HAVING RECESSED PATTERN, RESIN COMPOSITION, METHOD FOR FORMING ELECTROCONDUCTIVE FILM, ELECTRONIC CIRCUIT, AND ELECTRONIC DEVICE
  申请人：JSR CORPORATION

  公开号：US20170306481A1

  公开（公告）日：2017-10-26

  The present invention relates to: a method of producing a structure having a recessed pattern; a resin composition; a method of forming an electroconductive film; an electronic circuit; and an electronic device. The method of producing a structure having a recessed pattern includes the following steps (i) and (ii), and the recessed pattern has a film thickness that is thinner by 5% to less than 90% with respect to that of a coating film obtained in the step (i): (i) the step of forming a coating film on a non-flat surface of a structure using a resin composition which includes an acid-dissociable group-containing polymer and an acid generator; and (ii) the step of forming a recess by subjecting a prescribed part of a portion of the coating film to irradiation with radiation.
• US5211873A
  申请人：——

  公开号：US5211873A

  公开（公告）日：1993-05-18
• US6383669B1
  申请人：——

  公开号：US6383669B1

  公开（公告）日：2002-05-07