Trifluoromethyl-substituted compounds are formed in a corona discharge or glow discharge plasma of trifluoromethyl radicals from an organic trifluoromethyl source. A substrate possessing easily replaceable ligands such as halogen or carbonyl, is initially contacted either in the plasma and within a short distance from a downstream visible edge of the plasma or outside of the visible portion of the plasma and within a short distance from the downstream visible edge, to effect a substitution of the halogen or carbonyl ligand on the substrate with a trifluoromethyl radical without substantial decomposition of the substrate.
三
氟甲基取代化合物是在有机三
氟甲基源的电晕放电或辉光放电等离子体中形成的。最初,接触具有易于替换
配体(如卤素或羰基)的基底,可以在等离子体内且距离下游可见边缘短距离处或在可见部分之外且距离下游可见边缘短距离处,以使基底上的卤素或羰基
配体被
三氟甲基自由基替换而不会发生基底的大量分解。