Synthesis and Characterization of Copper(I) Amidinates as Precursors for Atomic Layer Deposition (ALD) of Copper Metal
作者:Zhengwen Li、Seán T. Barry、Roy G. Gordon
DOI:10.1021/ic048492u
日期:2005.3.21
A series of copper(I) amidinates of the general type [(R ' NC(R)NR '')Cu](2) (R ' and R '' = n-propyl, isopropyl, n-butyl, isobutyl, sec-butyl, tert-butyl; R = methyl, n-butyl) have been synthesized and characterized. These compounds are planar dimers, bridged by nearly linear N-Cu-N bonds. Their properties (volatility, low melting point, high thermal stability, and self-limited surface reactivity) are well-suited for atomic layer deposition (ALD) of copper metal films that are pure, highly conductive, conformal, and strongly adherent to substrates.
METAL(IV) TETRA-AMIDINATE COMPOUNDS AND THEIR USE IN VAPOR DEPOSITION
申请人:President and Fellows of Harvard College
公开号:EP2032529B1
公开(公告)日:2012-10-17
Metal (IV) tetra-amidinate compounds and their use in vapor deposition
申请人:Gordon Roy G.
公开号:US20080003359A1
公开(公告)日:2008-01-03
Metal(IV) tetrakis(N,N′-dialkylamidinates) were synthesized and characterized. Exemplary metals include hafnium, zirconium, tantalum, niobium, tungsten, molybdenum, tin and uranium. These compounds are volatile, highly stable thermally, and suitable for vapor deposition of metals and their oxides, nitrides and other compounds.
US7638645B2
申请人:——
公开号:US7638645B2
公开(公告)日:2009-12-29
Use of lanthanide(III) ions as catalysts for the reactions of amines with nitriles
作者:John H. Forsberg、Vincent T. Spaziano、Trichey M. Balasubramanian、Gordon K. Liu、Steven A. Kinsley、Charles A. Duckworth、John J. Poteruca、Paul S. Brown、Judith L. Miller