2-(Methylthio)-2-phenylpropane | 98821-10-4

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: 2-(Methylthio)-2-phenylpropane
• 英文别名: cumyl methyl sulfide；α-Thiomethoxycumen；2-Methylsulfanylpropan-2-ylbenzene
• CAS: 98821-10-4
• 化学式: C₁₀H₁₄S
• 分子量: 166.287
• InChiKey: FPRRGZGFJICDMZ-UHFFFAOYSA-N

物化性质

• 沸点：
  223.8±9.0 °C(Predicted)
• 密度：
  0.977±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  3
• 重原子数：
  11
• 可旋转键数：
  2
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.4
• 拓扑面积：
  25.3
• 氢给体数：
  0
• 氢受体数：
  1

反应信息

• 作为反应物：
  描述：

  2-(Methylthio)-2-phenylpropane 在 间氯过氧苯甲酸 作用下， 以 二氯甲烷 为溶剂， 反应 0.5h， 以98%的产率得到(2-(methylsulfonyl)propan-2-yl)benzene
  参考文献：
  名称：

  Nucleofugality of the sulfinate group in carbocation-forming processes

  摘要：

  DOI：

  10.1021/jo00225a017
• 作为产物：
  描述：

  2-Phenyl-2-propanol THP ether 在 三氟化硼乙醚 、 dimethylthio-dimethyl-tin 作用下， 以 甲苯 为溶剂， 反应 4.0h， 以84%的产率得到2-(Methylthio)-2-phenylpropane
  参考文献：
  名称：

  Activation and synthetic applications of thiostannanes. Deprotection and transformations of tetrahydropyranyl ethers

  摘要：

  DOI：

  10.1021/jo00302a057

文献信息

• ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMATION METHOD, AND PRODUCTION METHOD FOR ELECTRONIC DEVICE
  申请人：FUJIFILM Corporation

  公开号：EP3885378A1

  公开（公告）日：2021-09-29

  An object of the present invention is to provide an actinic ray-sensitive or radiation-sensitive resin composition, in which the cross-sectional shape of a pattern thus formed has excellent rectangularity and a dimensional variation of the line width of the pattern thus formed hardly occurs even over time after preparation. Furthermore, another object of the present invention is to provide a resist film, a pattern forming method, and a method for manufacturing an electronic device, each using the actinic ray-sensitive or radiation-sensitive resin composition. The actinic ray-sensitive or radiation-sensitive resin composition of an embodiment of the present invention includes a resin having a polarity that increases through decomposition by an action of an acid, a compound that generates an acid upon irradiation with actinic rays or radiation, and a halogen-based solvent, in which a content of the halogen-based solvent is from 1 ppb by mass to 50 ppm by mass with respect to a total mass of the composition.

  本发明的一个目的是提供一种对辐射线敏感或辐射敏感的树脂组合物，在这种组合物中，由此形成的图案的横截面形状具有极佳的矩形性，而且由此形成的图案的线宽即使在制备后一段时间内也几乎不会发生尺寸变化。此外，本发明的另一个目的是提供一种抗蚀剂薄膜、一种图案形成方法和一种制造电子设备的方法，每种方法都使用了对放 射线敏感或对辐射敏感的树脂组合物。 本发明一个实施例中的对放 射线敏感或对辐射敏感的树脂组合物包括极性在酸的作用下分解而增加的树脂、在放 射线或辐射照射下产生酸的化合物和卤素基溶剂，其中卤素基溶剂的含量相对于组合物的总 质量为 1 ppb 至 50 ppm。
• Urea compound and preparation method and application thereof
  申请人：SHENZHEN CHIPSCREEN BIOSCIENCES CO., LTD.

  公开号：US10654815B2

  公开（公告）日：2020-05-19

  The present invention relates to a urea compound and a preparation method and an application thereof. The structure of the present compound is represented by formula (I), the definition of each variable in the formula being as described in the description. The compound can block interaction between the PD-1/PD-L1 signalling pathways. The compound of the present invention can be used for treating or preventing diseases related to the signalling pathways, such as cancer, autoimmune disease, chronic infectious disease, and other diseases.

  本发明涉及一种尿素化合物及其制备方法和应用。本发明化合物的结构用式（I）表示，式中各变量的定义如说明书所述。本发明化合物可阻断 PD-1/PD-L1 信号通路之间的相互作用。本发明化合物可用于治疗或预防与信号通路有关的疾病，如癌症、自身免疫性疾病、慢性传染病和其他疾病。
• Color developing composition, lithographic printing plate precursor, method for producing lithographic printing plate, and compound
  申请人：FUJIFILM Corporation

  公开号：US11117364B2

  公开（公告）日：2021-09-14

  Provided are a color developing composition including a compound represented by Formula 1, a lithographic printing plate precursor having at least a layer including the color developing composition, a method for producing a lithographic printing plate in which the lithographic printing plate precursor is used, and a compound represented by Formula 1.

  本文提供了一种包括式 1 所示化合物的显色组合物、一种至少有一层包括该显色组合物的平版印刷版原版、一种使用该平版印刷版原版生产平版印刷版的方法，以及一种式 1 所示化合物。
• A free-radical chain reaction involving electron transfer. The replacement of the nitro group by hydrogen using trialkyltin hydride, a variation of the Kornblum reaction
  作者：Dennis D. Tanner、Edward V. Blackburn、Gilberto E. Diaz

  DOI：10.1021/ja00396a044

  日期：1981.3
• Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same
  申请人：FUJIFILM Corporation

  公开号：EP1621927B1

  公开（公告）日：2018-05-23