RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING COMPOUND HAVING HYDANTOIN RING
                        
                            
                                申请人:NISSAN CHEMICAL CORPORATION
                            
                            
                                公开号:US20200201183A1
                            
                            
                                公开(公告)日:2020-06-25
                            
                            A novel resist underlayer film forming composition containing a compound has a hydantoin ring. A resist underlayer film forming composition has a compound having at least two substituents of the following formula (1):
(wherein R
1
and R
2
are each independently a hydrogen atom or a methyl group, and X
1
is a C
1-3
hydroxyalkyl group or a C
2-6
alkyl group having one or two ether bonds in a main chain) in the molecule, and a solvent.