Reductive cleavage of geminal bis-phenylsulfones using lithium naphthalenide in THF at -78 degrees C selectively affords alpha-sulfonyl carbanions which participate in typical reaction with electrophiles.
Stereospecific dehydrative alkylation of bis-sulfones: synthesis of a lesser tea tortrix pheromone
摘要:
The intra- and intermolecular condensation of alcohols with bis-sulfone methylenes, i.e., dehydrative alkylation, using DEAD and Ph3P proceeds stereospecifically at room temperature under essentially neutral conditions affording good to excellent yields of alkylation/annulation products.
The present invention relates to sulfone derivatives of formula (I):
Ar—SO
2
—CR
2
R
3
-L-N(R
1
)
2
I
wherein Ar, L, R
1
, R
2
and R
3
are as defined herein, and pharmaceutically acceptable salts and N-oxides thereof, useful in the treatment of a condition which is susceptible to treatment by modulation of 5-HT
7
receptor activity, such as depression or a sleep disorder.
Activation parameters for intramolecular nucleophilic substitution by carbanions—the insignificant effect of ring strain on cyclisation rates
作者:Fabio Benedetti、Charles J. M. Stirling
DOI:10.1039/c39830001374
日期:——
Activationparameters for the cyclisation of bis-sulphonyl-stabilised carbanions to bis-sulphonylcycloalkanes have been determined; cyclopropanes form nearly a million-fold faster than cyclobutanes and ringstrain is a negligible factor in determining reactivity.
The present disclosure relates to novel methanofullerene derivatives, negative-type photoresist compositions prepared therefrom and methods of using them. The derivatives, their photoresist compositions and the methods are ideal for fine pattern processing using, for example, ultraviolet radiation, beyond extreme ultraviolet radiation, extreme ultraviolet radiation, X-rays and charged particle rays.
The present disclosure relates to novel methanofullerene derivatives, negative- type photoresist compositions prepared therefrom and methods of using them. The derivatives, their photoresist compositions and the methods are ideal for fine pattern processing using, for example, ultraviolet radiation, beyond extreme ultraviolet radiation, extreme ultraviolet radiation, X-rays and charged particle rays.
The present disclosure relates to novel methanofullerene derivatives, negative- type photoresist compositions prepared therefrom and methods of using them. The derivatives, their photoresist compositions and the methods are ideal for fine pattern processing using, for example, ultraviolet radiation, beyond extreme ultraviolet radiation, extreme ultraviolet radiation, X-rays and charged particle rays. Negative photosensitive compositions are also disclosed.