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4-Amino-2,3,5,6-tetrafluorobenzenesulfonic acid | 103839-11-8

中文名称
——
中文别名
——
英文名称
4-Amino-2,3,5,6-tetrafluorobenzenesulfonic acid
英文别名
——
4-Amino-2,3,5,6-tetrafluorobenzenesulfonic acid化学式
CAS
103839-11-8
化学式
C6H3F4NO3S
mdl
——
分子量
245.15
InChiKey
CEQIYAWWTHUXIE-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    -0.2
  • 重原子数:
    15
  • 可旋转键数:
    1
  • 环数:
    1.0
  • sp3杂化的碳原子比例:
    0.0
  • 拓扑面积:
    88.8
  • 氢给体数:
    2
  • 氢受体数:
    8

文献信息

  • ENERGY PROVIDING DEVICES AND APPLICATIONS THEREOF
    申请人:The Regents of the University of California
    公开号:US20180159106A1
    公开(公告)日:2018-06-07
    Disclosed herein are compositions for use in an energy providing devices and methods of preparing such devices. Also included herein is energy providing devices that comprise a charged compound modified substrate or zwitterion-modified substrate or energy providing devices that comprise an electrolyte that comprises a perhalogenatedphenyl azide charged or zwitterionic compound.
    本文公开了用于能量提供设备的组合物及其制备方法。还包括包含带电化合物修饰基质或双离子修饰基质的能量提供设备,或包括电解质的能量提供设备,该电解质包括带电或双离子化合物的过卤素苯基偶氮化物。
  • ACTIVE LIGHT RAY SENSITIVE OR RADIOACTIVE RAY SENSITIVE RESIN COMPOSITION, AND ACTIVE LIGHT RAY SENSITIVE OR RADIOACTIVE RAY SENSITIVE FILM AND PATTERN FORMING METHOD USING THE SAME
    申请人:KAWABATA Takeshi
    公开号:US20120082939A1
    公开(公告)日:2012-04-05
    An active light ray sensitive or radioactive ray sensitive resin composition which satisfies high sensitivity, high resolution, good pattern configuration, and good line edge roughness at the same time to a great extent, while having sufficiently good outgassing performance during exposure, and an active light ray sensitive or radioactive ray sensitive film formed by using the composition, and a pattern-forming method, are provided. The active light ray sensitive or radioactive ray sensitive resin composition according to the present invention includes a resin (P) containing a repeating unit (A) which decomposes by irradiation with active light ray or radioactive ray to generate an acid, and a repeating unit (C) containing a primary or secondary hydroxyl group.
    提供了一种活性光线敏感或放射线敏感的树脂组合物,其在很大程度上同时满足高灵敏度、高分辨率、良好的图案配置和良好的线边粗糙度,同时在曝光期间具有足够好的排气性能,以及使用该组合物形成的活性光线敏感或放射线敏感薄膜和形成图案的方法。本发明的活性光线敏感或放射线敏感的树脂组合物包括含有重复单元(A)的树脂(P),该重复单元通过活性光线或放射线辐射分解生成酸,并且含有主要或次要羟基的重复单元(C)。
  • Polymer modification
    申请人:PolyMASC Pharmaceuticals plc
    公开号:EP1026171A1
    公开(公告)日:2000-08-09
    A process for producing an adduct of a polymer and a target material which process comprises the steps of (a) reacting tresyl chloride with a polymer of formula (II)         (C)c POL - Gg     (II) wherein POL is a polymer moiety of valency c+g, C is a capping group and c is zero or a positive number and G is a terminal hydroxyl group reactive with the compound of formula (I) and g is a positive number so as to form a sulphonate ester-activated polymer of formula (III)         (C)c POL - (tresyl)g     (III) wherein C, POL, -AM, c and g are as defined above (b) reacting the activated polymer of formula (III) with the target material and (c) recovering the adduct of the polymer and the target material, in which process: (i) the polymer of formula (II) is dry as determined by benzene distillation, and (ii) the reaction of the tresyl chloride with the polymer of formula (II) is conducted in an organic solvent which is inert to the reagents and to the product of formula (III) and is anhydrous as obtainable using molecular sieves of 0.3nm; (iii) the reaction of the tresyl chloride with the polymer of formula (II) is conducted in a reaction vessel from which water is excluded; (iv) the activated polymer of formula (III) so produced is recovered and either used directly in step (b) or stored, prior to use in step (b), in the presence of a desiccating agent more hygroscopic than the product of formula (III); and v) the reaction of the activated polymer with the target material is conducted in a non-denaturing medium and non-denaturing temperature with respect to the target material.
    一种生产聚合物和目标材料加合物的工艺,该工艺包括以下步骤 (a) 使甲酰氯与式 (II) 的聚合物反应 (C)c POL - Gg (II) 其中 POL 是化合价为 c+g 的聚合物分子、 C 是封端基团,c 为零或正数,以及 G 是与式 (I) 化合物反应的末端羟基,g 为正数 从而形成 式(III)的磺酸酯活性聚合物 (C)c POL - (甲苯基)g (III) 其中 C、POL、-AM、c 和 g 如上定义 (b) 使式(III)的活化聚合物与目标材料反应,并 (c) 回收聚合物与目标材料的加合物、 在该过程中 (i) 根据苯蒸馏法测定,式(II)聚合物是干的,以及 (ii) 甲酰氯与式(II)聚合物的反应在对试剂和式(III)产物惰性且无水的有机溶剂中进行,该有机溶剂可使用 0.3nm 的分子筛获得; (iii) 三氯甲烷与式(II)聚合物的反应是在不含水的反应容器中进行的; (iv) 如此制得的式(III)活化聚合物被回收并直接用于步骤(b),或在用于步骤(b)之前, 在比式(III)产物吸湿性更强的干燥剂存在下储存;以及 v) 活性聚合物与目标材料的反应是在非变性介质和相对于目标材料的非变性温度下进行的。
  • Universal scalable and cost-effective surface modifications
    申请人:The Regents of the University of California
    公开号:US10315169B2
    公开(公告)日:2019-06-11
    Disclosed are fouling resistant filtration membranes comprising a polymeric thin-film membrane comprising a surface. Also disclosed are methods of modifying thin-film filtration membranes, thereby improving, for example, the anti-fouling properties of the membranes. Also disclosed are methods of purifying water using the disclosed membranes. This abstract is intended as a scanning tool for purposes of searching in the particular art and is not intended to be limiting of the present invention.
    所公开的是抗污垢过滤膜,包括由表面组成的聚合物薄膜膜。还公开了改性薄膜过滤膜的方法,从而改善膜的防污性能等。还公开了使用公开的膜净化水的方法。本摘要旨在作为在特定技术领域进行搜索的扫描工具,并非对本发明的限制。
  • Energy providing devices and applications thereof
    申请人:The Regents of the University of California
    公开号:US10629880B2
    公开(公告)日:2020-04-21
    Disclosed herein are compositions for use in an energy providing devices and methods of preparing such devices. Also included herein is energy providing devices that comprise a charged compound modified substrate or zwitterion-modified substrate or energy providing devices that comprise an electrolyte that comprises a perhalogenatedphenyl azide charged or zwitterionic compound.
    本文公开了用于能量提供装置的组合物以及制备此类装置的方法。本文还包括由带电化合物改性基质或齐聚物改性基质组成的能量提供装置,或由全卤化苯基叠氮带电化合物或齐聚物组成的电解质组成的能量提供装置。
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