1-tridecyl-pyrrolidin-2-one | 7426-00-8

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 吡咯烷类
• 英文名称: 1-tridecyl-pyrrolidin-2-one
• 英文别名: 1-Tridecyl-pyrrolidin-2-on；1-Tridecylpyrrolidin-2-one
• CAS: 7426-00-8
• 化学式: C₁₇H₃₃NO
• 分子量: 267.455
• InChiKey: YPJPWJJRCJXTOR-UHFFFAOYSA-N

物化性质

• 沸点：
  210-213 °C(Press: 9.5 Torr)
• 密度：
  0.905±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  5.9
• 重原子数：
  19
• 可旋转键数：
  12
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.94
• 拓扑面积：
  20.3
• 氢给体数：
  0
• 氢受体数：
  1

反应信息

• 作为产物：
  描述：

  γ-丁内酯 、 正十三胺 生成 1-tridecyl-pyrrolidin-2-one
  参考文献：
  名称：

  N-取代的2-吡咯烷酮。

  摘要：

  DOI：

  10.1021/ja01195a518

文献信息

• RESIST COMPOSITION, MULTILAYER BODY, AND METHOD FOR FORMING RESIST PATTERN
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：EP1643306A1

  公开（公告）日：2006-04-05

  A resist composition is disclosed that enables formation of a favorable resist pattern using a shrink process in which, following formation of the resist pattern, a treatment such as heating is used to narrow the resist pattern, and also disclosed are a laminate and a method for forming a resist pattern that use such a resist composition. This resist composition includes a resin component (A) that displays changed alkali solubility under the action of acid, and an acid generator component (B) that generates acid on exposure. The component (A) contains structural units derived from a (meth)acrylate ester, and exhibits a glass transition temperature that falls within a range from 120 to 170°C.

  本发明公开了一种抗蚀剂组合物，该组合物可以使用收缩工艺形成有利的抗蚀图案，在抗蚀图案形成后，使用加热等处理方法缩小抗蚀图案，本发明还公开了使用这种抗蚀剂组合物的层压板和形成抗蚀图案的方法。这种抗蚀剂组合物包括在酸作用下碱溶解性发生变化的树脂成分（A）和在曝光时产生酸的酸发生器成分（B）。组分（A）包含由（甲基）丙烯酸酯衍生的结构单元，其玻璃化温度在 120 至 170°C 之间。
• TRANSDERMAL ABSORPTION-TYPE PATCH PREPARATION COMPRISING ZONISAMIDE
  申请人：Teikoku Seiyaku Co., Ltd.

  公开号：EP3434269A1

  公开（公告）日：2019-01-30

  To provide to a transdermal absorption-type patch preparation containing zonisamide, that is a transdermal absorption-type patch preparation containing zonisamide or an alkali metal salt thereof, being capable of maintaining a high concentration of a drug in a dissolved state in the preparation and exhibiting sufficient and sustained drug efficacy. A transdermal absorption-type patch preparation containing an adhesive layer, the adhesive layer containing zonisamide or an alkali metal salt thereof, an adhesive agent containing a (meth)acrylic copolymer having a pyrrolidone group, and a transdermal absorption promoter containing N-alkylpyrrolidone.

  提供一种含有唑尼沙胺的透皮吸收型贴剂，即一种含有唑尼沙胺或其碱金属盐的透皮吸收型贴剂，能够在制剂中保持高浓度的药物溶解状态，并显示出足够和持续的药效。 一种透皮吸收型贴剂制剂，含有粘合剂层，粘合剂层含有唑尼沙胺或其碱金属盐，粘合剂含有具有吡咯烷酮基团的（甲基）丙烯酸共聚物，以及透皮吸收促进剂含有N-烷基吡咯烷酮。
• Resist composition, multilayer body, and method for forming resist pattern
  申请人：Hada Hideo

  公开号：US20060154174A1

  公开（公告）日：2006-07-13

  A resist composition is disclosed that enables formation of a favorable resist pattern using a shrink process in which, following formation of the resist pattern, a treatment such as heating is used to narrow the resist pattern, and also disclosed are a laminate and a method for forming a resist pattern that use such a resist composition. This resist composition includes a resin component (A) that displays changed alkali solubility under the action of acid, and an acid generator component (B) that generates acid on exposure. The component (A) contains structural units derived from a (meth)acrylate ester, and exhibits a glass transition temperature that falls within a range from 120 to 170° C.

  本发明公开了一种抗蚀剂组合物，该组合物可以使用收缩工艺形成有利的抗蚀图案，在抗蚀图案形成后，使用加热等处理方法缩小抗蚀图案，本发明还公开了使用这种抗蚀剂组合物的层压板和形成抗蚀图案的方法。这种抗蚀剂组合物包括在酸作用下碱溶解性发生变化的树脂成分（A）和在曝光时产生酸的酸发生器成分（B）。组分（A）含有由（甲基）丙烯酸酯衍生的结构单元，其玻璃化温度在 120 至 170 摄氏度之间。
• Over-coating agent for forming fine patterns and a method of forming fine patterns using such agent
  申请人：——

  公开号：US20040106737A1

  公开（公告）日：2004-06-03

  It is disclosed an over-coating agent for forming fine-line patterns which is applied to cover a substrate having thereon photoresist patterns and allowed to shrink under heat so that the spacing between adjacent photoresist patterns is lessened, with the applied film of the over-coating agent being removed substantially completely to form or define fine trace patterns, further characterized by containing a copolymer or a mixture of polyvinyl alcohol with a water-soluble polymer other than polyvinyl alcohol. Also disclosed is a method of forming fine-line patterns using the over-coating agent. According to the invention, one can effectively increase the shrinkage amount (the amount of heat shrinking) of the agent, thereby achieving a remarkably improved effect of forming or defining fine-line patterns and which also present satisfactory profiles and meet the characteristics required of today's semiconductor devices.
• Positive resist composition and process for formation of resist patterns
  申请人：Shimizu Hiroaki

  公开号：US20070166641A1

  公开（公告）日：2007-07-19

  A positive resist composition includes a resin component (A) and an acid generator component (B), wherein the component (A) is a copolymer that includes a structural unit (a1) derived from an (α-lower alkyl)acrylate ester that contains a monocyclic or polycyclic group-containing acid dissociable, dissolution inhibiting group, a structural unit (a2) derived from an (α-lower alkyl)acrylate ester that contains a lactone ring, a structural unit (a3) derived from an (α-lower alkyl)acrylate ester that contains a polar group-containing polycyclic group, and a structural unit (a4).