[2,3,4-tris[(E)-2-phenylethenyl]phenyl] prop-2-enoate

• 分子结构分类: 有机化合物 - 苯丙烷和聚酮 - 二芳基庚烷
• 英文名称: [2,3,4-tris[(E)-2-phenylethenyl]phenyl] prop-2-enoate
• 化学式: C₃₃H₂₆O₂
• 分子量: 454.6
• InChiKey: MYHKEBRDUHMGRF-BXVNPCGESA-N

计算性质

• 辛醇/水分配系数(LogP)：
  9.1
• 重原子数：
  35
• 可旋转键数：
  9
• 环数：
  4.0
• sp3杂化的碳原子比例：
  0.0
• 拓扑面积：
  26.3
• 氢给体数：
  0
• 氢受体数：
  2

文献信息

• [EN] WATER-BASED UV INKJET INK<br/>[FR] ENCRE À BASE D'EAU DURCISSABLE PAR UV POUR L'IMPRESSION PAR JET D'ENCRE
  申请人：SUN CHEMICAL CORP

  公开号：WO2015183719A1

  公开（公告）日：2015-12-03

  The invention describes the use of a water-based UV curable inkjet printing ink wherein the ink is basic due to the presence of a tertiary amine, allowing the complete dissolution of an acid functional photoinitiator of Formula I or Formula IA (wherein R1, R2, R3, n, q, and y are as defined herein). This combination of photoinitiator and tertiary amine allows the rapid low dosage UV curing of a water-based UV formulation using a UV LED light source.

  该发明描述了使用基于水的紫外光固化喷墨打印油墨，其中由于存在三级胺，油墨呈碱性，从而允许完全溶解式酸性光引发剂的使用，该光引发剂为I式或IA式（其中R1、R2、R3、n、q和y的定义如本文所述）。光引发剂和三级胺的组合使得使用紫外LED光源可以快速低剂量紫外光固化水性紫外配方。
• [EN] WATER SOLUBLE 3-KETOCOUMARINS<br/>[FR] 3-CÉTOCOUMARINES HYDROSOLUBLES
  申请人：IGM RESINS ITALIA SRL

  公开号：WO2019116177A1

  公开（公告）日：2019-06-20

  The present invention relates to novel 3-ketocoumarins with improved water compatibility, which are useful as photoinitiators and to compositions comprising said photoinitiators. The invention also relates to compositions comprising said novel 3-ketocoumarins and to a process for photopolymerizing comprising them.

  本发明涉及具有改善水相适应性的新型3-酮香豆素，其可用作光引发剂以及包含该光引发剂的组合物。本发明还涉及包含该新型3-酮香豆素的组合物以及包含它们的光聚合过程。
• High molecular weight polystyrene in inks and coatings
  申请人：SUN CHEMICAL CORPORATION

  公开号：US10689500B2

  公开（公告）日：2020-06-23

  Described herein are depolymerized polystyrene resins derived from polystyrene source resins. The depolymerized polystyrene resins undergo a depolymerization in which chemical bonds are cleaved, producing depolymerized polystyrene resins of lower molecular weight. The polystyrene resins may be modified by chemical reaction with monomers, polymers, and oligomers, such as acrylates thereof. Also described are ink and coating compositions that include the depolymerized and modified polystyrene resins.

  本文描述的是由聚苯乙烯源树脂衍生的解聚聚苯乙烯树脂。解聚聚苯乙烯树脂在解聚过程中化学键被裂解，产生分子量较低的解聚聚苯乙烯树脂。聚苯乙烯树脂可通过与单体、聚合物和低聚物（如丙烯酸酯）的化学反应进行改性。此外，还介绍了包括解聚和改性聚苯乙烯树脂的油墨和涂料组合物。
• Electron beam curable inkjet formulation with improved adhesion
  申请人：SUN CHEMICAL CORPORATION

  公开号：US10799911B2

  公开（公告）日：2020-10-13

  The present invention provides a method for printing energy curable ink and coating compositions that comprise high amounts of multifunctional monomers, achieving cured inks and coatings that exhibit good adhesion to plastic substrates, good resistance when cured, and low amounts of uncured, migratable monomers. The method of the present invention employs electron beam curing of the ink and coating compositions, at accelerating voltages greater than or equal to 70 keV, and electron beam doses greater than or equal to 30 kGy, and preferably greater than or equal to 40 kGy.

  本发明提供了一种印刷能量固化油墨和涂料组合物的方法，该组合物包含大量的多功能单体，固化后的油墨和涂料对塑料基材具有良好的附着力，固化后具有良好的抗性，且未固化的可迁移单体量少。本发明的方法采用电子束固化油墨和涂料组合物，加速电压大于或等于 70 keV，电子束剂量大于或等于 30 kGy，最好大于或等于 40 kGy。
• Electron beam curable inkjet formulations with improved chemical resistance
  申请人：SUN CHEMICAL CORPORATION

  公开号：US10864753B2

  公开（公告）日：2020-12-15

  The present invention is directed to a method for printing energy curable ink and coating compositions comprising high amounts of monofunctional monomers that exhibit both good adhesion to plastic substrates, and good solvent resistance. The method of the present invention employs electron beam curing of the ink and coating compositions, at accelerating voltages greater than or equal to 70 keV, and electron beam doses greater than or equal to 30 kGy, and preferably greater than or equal to 40 kGy.

  本发明涉及一种印刷能量固化油墨和涂料组合物的方法，该组合物包含大量的单官能团单体，对塑料基材具有良好的附着力和耐溶剂性。本发明的方法采用电子束固化油墨和涂料组合物，加速电压大于或等于 70 keV，电子束剂量大于或等于 30 kGy，最好大于或等于 40 kGy。