[1,3-Bis(methoxymethyl)-2-oxo-1,3-diazinan-5-yl] 2-methylbutanoate

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 二嗪类
• 英文名称: [1,3-Bis(methoxymethyl)-2-oxo-1,3-diazinan-5-yl] 2-methylbutanoate
• 英文别名: [1,3-bis(methoxymethyl)-2-oxo-1,3-diazinan-5-yl] 2-methylbutanoate
• 化学式: C₁₃H₂₄N₂O₅
• 分子量: 288.34
• InChiKey: WUYMNSNETNQTBX-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  0.8
• 重原子数：
  20
• 可旋转键数：
  8
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.85
• 拓扑面积：
  68.3
• 氢给体数：
  0
• 氢受体数：
  5

文献信息

• ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM, MASK BLANK AND METHOD OF FORMING PATTERN
  申请人：FUJIFILM Corporation

  公开号：US20140242502A1

  公开（公告）日：2014-08-28

  According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes a compound (A) that contains a structure (P) containing at least one phenolic hydroxyl group and a structure (Q) containing at least one phenolic hydroxyl group whose hydrogen atom is replaced by a group (S) with a cyclic structure containing an acid crosslinking group, characterized in that the group (S) with a cyclic structure containing an acid crosslinking group is a group with a polycyclic structure or a group with a cyclic structure containing a hydroxymethyl group and/or an alkoxymethyl group.
• ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, MASK BLANK INCLUDING ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
  申请人：FUJIFILM Corporation

  公开号：US20180120701A1

  公开（公告）日：2018-05-03

  According to the present invention, an actinic ray-sensitive or radiation-sensitive resin composition including a compound (A) whose dissolution rate in an alkali developer decreases by the action of an acid, a hydrophobic resin (B), and a resin (C) having an aromatic ring, as well as a film, a mask blank, a pattern forming method, and a method for manufacturing an electronic device, each using the composition, are provided.
• US9400430B2
  申请人：——

  公开号：US9400430B2

  公开（公告）日：2016-07-26