COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, RESIST UNDERLAYER FILM AND RESIST UNDERLAYER FILM-FORMING METHOD, AND PATTERN-FORMING METHOD
申请人:JSR CORPORATION
公开号:US20150198882A9
公开(公告)日:2015-07-16
A composition for forming a resist underlayer film includes a polymer having a structural unit represented by a formula (1). Ar
1
, Ar
2
, Ar
3
and Ar
4
each independently represent a divalent aromatic hydrocarbon group or a divalent heteroaromatic group. A part or all of hydrogen atoms included in the divalent aromatic hydrocarbon group and the divalent heteroaromatic group represented by Ar
1
, Ar
2
, Ar
3
or Ar
4
may be substituted. R
1
represents a single bond or a divalent hydrocarbon group having 1 to 20 carbon atoms. A part or all of hydrogen atoms included in the divalent hydrocarbon group represented by R
1
may be substituted. The divalent hydrocarbon group represented by R
1
may have an ester group, an ether group or a carbonyl group in a structure thereof. Y represents a carbonyl group or a sulfonyl group. m is 0 or 1. n is 0 or 1.