6-氯-1-甲氧基-苯并三唑 | 68930-08-5

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 苯并三唑类
• 中文名称: 6-氯-1-甲氧基-苯并三唑
• 英文名称: 1-Methoxy-6-chlorbenzotriazol
• 英文别名: 6-Chloro-1-methoxy-benzotriazole；6-chloro-1-methoxybenzotriazole
• CAS: 68930-08-5
• 化学式: C₇H₆ClN₃O
• 分子量: 183.597
• InChiKey: PAIFCPOODZQKSG-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.1
• 重原子数：
  12
• 可旋转键数：
  1
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.14
• 拓扑面积：
  39.9
• 氢给体数：
  0
• 氢受体数：
  3

反应信息

• 作为产物：
  描述：

  6-氯-1-羟基苯并三氮唑 、 甲醇 以90%的产率得到
  参考文献：
  名称：

  GROCHOWSKI E.; FALENT-KWASTOWA E., J. CHEM. RES. SYNOP., 1978, NO 8, 300-301

  摘要：

  DOI：

文献信息

• CLEANING COMPOSITION AND METHOD OF MANUFACTURING METAL WIRING USING THE SAME
  申请人：Samsung Display Co., Ltd.

  公开号：US20150136728A1

  公开（公告）日：2015-05-21

  A cleaning composition includes about 0.01 to about 5 wt % of a chelating agent; about 0.01 to about 0.5 wt % of an organic acid; about 0.01 to about 1.0 wt % of an inorganic acid; about 0.01 to about 5 wt % of an alkali compound; and deionized water.
• TRIZOL-1-OL ANALOGS ANTI-RETROVIRAL LATENCY DRUGS
  申请人：UNIVERSITY OF UTAH RESEARCH FOUNDATION

  公开号：US20160151365A1

  公开（公告）日：2016-06-02

  In one aspect, the invention relates to triazol-1-ol compounds, analogs thereof, compositions comprising same, and methods of using same, alone or in combination with other agents, to reactivate latent retroviruses, and more particularly to reactivate latent HIV-1. Such compounds, compositions, and methods can be used, for example, in connection with diagnosing and/or treating a retrovirus, and more specifically HIV-1. This abstract is intended as a scanning tool for purposes of searching in the particular art and is not intended to be limiting of the present invention.
• CLEANER COMPOSITION FOR PROCESS OF MANUFACTURING SEMICONDUCTOR AND DISPLAY
  申请人：LTCAM CO., LTD.

  公开号：US20160215241A1

  公开（公告）日：2016-07-28

  There is provided a cleaner composition for a process of manufacturing a semiconductor and a display. The cleaner composition includes 0.01 to 5.0 wt % of amino acid-based chelating agent, 0.01 to 1.5 wt % of organic acid, 0.01 to 1.0 wt % of inorganic acid, 0.01 to 5.0 wt % of alkali compound, and the balance of deionized water and is based on acidic water with pH levels of 1 to 5. The cleaner composition may enhance metal contaminants removal capability and have a function to remove particles and organic contaminants, and prevent corrosion of copper and reverse adsorption of copper. Thus, cleaner composition may be used for various purposes of etching copper, removing residues, and a cleaner by adjusting an etch rate.
• US9340759B2
  申请人：——

  公开号：US9340759B2

  公开（公告）日：2016-05-17
• US9730928B2
  申请人：——

  公开号：US9730928B2

  公开（公告）日：2017-08-15