Hardmask composition and method of forming patterns using the hardmask composition
申请人:SAMSUNG SDI CO., LTD.
公开号:US10018914B2
公开(公告)日:2018-07-10
A hardmask composition includes a polymer including a moiety represented by the following Chemical Formula 1 and a solvent.
*-A-B—* [Chemical Formula 1]
In the Chemical Formula 1, A and B are the same as defined in the detailed description.
HARDMASK COMPOSITION AND METHOD OF FORMING PATTERNS USING THE HARDMASK COMPOSITION
申请人:SAMSUNG SDI CO., LTD.
公开号:US20150332931A1
公开(公告)日:2015-11-19
A hardmask composition includes a polymer including a moiety represented by the following Chemical Formula 1 and a solvent.
*-A-B-* [Chemical Formula 1]
In the Chemical Formula 1, A and B are the same as defined in the detailed description.