SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
申请人:SUMITOMO CHEMICAL COMPANY, LIMITED
公开号:US20160334702A1
公开(公告)日:2016-11-17
A salt represented by formula (I):
wherein Q
1
and Q
2
independently represent a fluorine atom or a C
1
to C
6
perfluoroalkyl group, R
1
and R
2
in each occurrence independently represent a hydrogen atom, a fluorine atom or a C
1
to C
6
perfluoroalkyl group, z represents an integer of 0 to 6, X
1
represents *—CO—O—, *—O—CO— or —O—, * represents a binding position to C(R
1
)(R
2
) or C(Q
1
)(Q
2
), A
1
represents a C
4
to C
24
hydrocarbon group having a C
4
to C
18
divalent alicyclic hydrocarbon moiety, A
2
represents a C
2
to C
12
divalent hydrocarbon group, R
3
and R
4
independently represent a hydrogen atom or a C
1
to C
6
monovalent saturated hydrocarbon group, R
5
represents a hydrogen atom, a fluorine atom, or a C
1
to C
6
alkyl group where a hydrogen atom may be replaced by a fluorine atom, and Z
+
represents an organic cation.
公式(I)表示的盐,其中Q1和Q2独立地代表一个氟原子或一个C1至C6的过氟烷基团,R1和R2每次出现独立地代表一个氢原子、一个氟原子或一个C1至C6的过氟烷基团,z代表0到6的整数,X1代表*—CO—O—,*—O—CO—或—O—,*代表与C(R1)(R2)或C(Q1)(Q2)的连接位置,A1代表具有C4至C18二价脂环烃基团的C4至C24的烃基团,A2代表C2至C12的二价烃基团,R3和R4独立地代表一个氢原子或一个C1至C6的一价饱和烃基团,R5代表一个氢原子、一个氟原子或一个C1至C6的烷基团,其中氢原子可以被氟原子替换,而Z+代表一个有机阳离子。