2-Methyl-5-propyl-pyrrolidin | 90886-40-1

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 吡咯烷类
• 英文名称: 2-Methyl-5-propyl-pyrrolidin
• 英文别名: 2-Methyl-5-n-propylpyrrolidine；2-methyl-5-propylpyrrolidine
• CAS: 90886-40-1
• 化学式: C₈H₁₇N
• mdl: MFCD19218282
• 分子量: 127.23
• InChiKey: AYWQPMPVPSZNAZ-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2
• 重原子数：
  9
• 可旋转键数：
  2
• 环数：
  1.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  12
• 氢给体数：
  1
• 氢受体数：
  1

反应信息

• 作为产物：
  描述：

  5-aminooct-1-ene 在 Sm[N(TMS)2]3 作用下， 以 四氢呋喃 为溶剂， 反应 24.0h， 以95%的产率得到2-Methyl-5-propyl-pyrrolidin
  参考文献：
  名称：

  An in situ generated samarium complex as a practical catalyst for the efficient intramolecular hydroamination of non-activated alkenes

  摘要：

  Mixing Sml(2) and NaN(TMS)(2) generates in situ an efficient catalyst that promotes the intramolecular hychoamination of non-activated olefins. A wide range of aminoolefins can be cyclised smoothly using this simple protocol. Mechanistic studies led to the identification of the putative active catalyst. (c) 2008 Elsevier Ltd. All rights reserved.

  DOI：

  10.1016/j.tetlet.2008.06.053

文献信息

• [EN] 6-SUBSTITUTED INDOLE COMPOUNDS<br/>[FR] COMPOSÉS INDOLES SUBSTITUÉS EN POSITION 6
  申请人：GILEAD SCIENCES INC

  公开号：WO2022140325A1

  公开（公告）日：2022-06-30

  The present disclosure relates generally to certain compounds, pharmaceutical compositions comprising said compounds, and methods of making and using said compounds and pharmaceutical compositions. The compounds and compositions provided herein may be used for the treatment or prevention of an autoimmune disease and/or inflammatory condition, including systemic lupus erythematosus and cutaneous lupus erythematosus.

  本公开涉及某些化合物、包含所述化合物的制药组合物以及制备和使用所述化合物和制药组合物的方法。本文提供的化合物和组合物可用于治疗或预防自身免疫性疾病和/或炎症病状，包括全身性红斑狼疮和皮肤型红斑狼疮。
• PYRROLOTRIAZINE KINASE INHIBITORS
  申请人：Bristol-Myers Squibb Company

  公开号：EP3054955B1

  公开（公告）日：2018-05-30
• [EN] HAFNIUM-CONTAINING PRECURSORS FOR VAPOR DEPOSITION<br/>[FR] PRÉCURSEURS CONTENANT DU HAFNIUM POUR UN DÉPÔT EN PHASE VAPEUR
  申请人：AIR LIQUIDE

  公开号：WO2013177284A1

  公开（公告）日：2013-11-28

  Disclosed are hafnium-containing precursors and methods of synthesizing the same. The precursors may be used to deposit hafnium oxide, hafnium silicon oxide and hafnium-metal oxide containing layers using vapor deposition methods such as chemical vapor deposition or atomic layer deposition.
• [EN] TITANIUM-CONTAINING PRECURSORS FOR VAPOR DEPOSITION<br/>[FR] PRÉCURSEURS CONTENANT DU TITANE POUR UN DÉPÔT EN PHASE VAPEUR
  申请人：AIR LIQUIDE

  公开号：WO2013177292A1

  公开（公告）日：2013-11-28

  Disclosed are titanium-containing precursors and methods of synthesizing the same. The precursors may be used to deposit titanium oxide, titanium silicon oxide and titanium-metal oxide containing layers using vapor deposition methods such as chemical vapor deposition or atomic layer deposition.
• [EN] ZIRCONIUM-CONTAINING PRECURSORS FOR VAPOR DEPOSITION<br/>[FR] PRÉCURSEURS CONTENANT DU ZIRCONIUM POUR LE DÉPÔT EN PHASE VAPEUR
  申请人：AIR LIQUIDE

  公开号：WO2013177269A2

  公开（公告）日：2013-11-28

  Disclosed are zirconium-containing precursors and methods of synthesizing the same. The precursors may be used to deposit zirconium oxide, zirconium silicon oxide and zirconium-metal oxide containing layers using vapor deposition methods such as chemical vapor deposition or atomic layer deposition.