申请人:Shin-Etsu Chemical Co., Ltd.
公开号:US20170008982A1
公开(公告)日:2017-01-12
A polymer comprising recurring units derived from a polymerizable monomer having two structures of hydroxyphenyl methacrylate having a hydroxy group substituted with an acid labile group is used as base resin in a positive resist composition, especially chemically amplified positive resist composition. The resist composition forms a resist film which is processed by lithography into a pattern of good profile having a high resolution, minimal edge roughness, and etch resistance.
一种聚合物,包含由可聚合单体衍生的重复单元,该单体具有两种羟基苯甲酸甲酯结构,羟基上取代有酸不稳定基团,作为正性光刻胶组成中的基础树脂,尤其是化学放大正性光刻胶组成中。该光刻胶组成形成一种光刻胶膜,通过光刻技术加工成具有高分辨率、最小边缘粗糙度和蚀刻抗性的良好轮廓图案。