申请人:NISSAN CHEMICAL INDUSTRIES, LTD.
公开号:US20180181000A1
公开(公告)日:2018-06-28
A radiation sensitive composition including a siloxane polymer exhibiting phenoplast crosslinking reactivity as a base resin, which is excellent in resolution and can be used as a radiation sensitive composition capable of allowing a pattern having a desired-shape to be formed with sufficient precision. A radiation sensitive composition including as a silane, a hydrolyzable silane, a hydrolysis product thereof, or a hydrolysis-condensation product thereof; and a photoacid generator, in which the hydrolyzable silane includes hydrolyzable silanes of Formula (1)
R
1
a
R
2
b
Si(R
3
)
4-(a+b)
Formula (1)
wherein R
1
is an organic group of Formula (1-2)
and is bonded to a silicon atom through a Si—C bond or a Si—O bond, and R
3
is a hydrolyzable group; and Formula (2)
R
7
c
R
8
d
Si(R
9
)
4-(c+d)
Formula (2)
wherein R
7
is an organic group of Formula (2-1)
and is bonded to a silicon atom through a Si—C bond or a Si—O bond, and R
9
is a hydrolyzable group.