triphenylsulfonium 1,1,2,2-tetrafluoro-6-(1-adamantanecarbonyloxy)hexane-1-sulfonate | 1204700-15-1

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: triphenylsulfonium 1,1,2,2-tetrafluoro-6-(1-adamantanecarbonyloxy)hexane-1-sulfonate
• 英文别名: 6-(Adamantane-1-carbonyloxy)-1,1,2,2-tetrafluorohexane-1-sulfonate;triphenylsulfanium；6-(adamantane-1-carbonyloxy)-1,1,2,2-tetrafluorohexane-1-sulfonate;triphenylsulfanium
• CAS: 1204700-15-1
• 化学式: C₁₇H₂₃F₄O₅S*C₁₈H₁₅S
• 分子量: 678.809
• InChiKey: YRRKZXMKAWXOLN-UHFFFAOYSA-M

计算性质

• 辛醇/水分配系数(LogP)：
  8.47
• 重原子数：
  46
• 可旋转键数：
  11
• 环数：
  7.0
• sp3杂化的碳原子比例：
  0.46
• 拓扑面积：
  92.9
• 氢给体数：
  0
• 氢受体数：
  9

反应信息

• 作为产物：
  描述：

  6-bromo-5,5,6,6-tetrafluorohexan-1-ol 在 sodium tungstate (VI) dihydrate sodium dithionite 、 双氧水 、 碳酸氢钠 、 三乙胺 作用下， 以 氯仿 、 水 、 乙腈 为溶剂， 反应 18.0h， 生成 triphenylsulfonium 1,1,2,2-tetrafluoro-6-(1-adamantanecarbonyloxy)hexane-1-sulfonate
  参考文献：
  名称：

  Novel Sulfonic Acid Salt and Derivative thereof, Photo-Acid Generator, and Process for Production of Sulfonic Acid Salt

  摘要：

  提供一种含氟磺酸盐或含有含氟磺酸基团的化合物，其结构由下列通式（1）表示。这种盐或化合物可以作为合适的光酸发生剂，并且可以形成具有优异敏感度、分辨率和掩模依赖性的光阻图案。[在通式（1）中，R代表取代或未取代的具有1至30个碳原子的线性或支链一价碳氢基团，取代或未取代的具有3至30个碳原子且具有环状或部分环状结构的一价碳氢基团，取代或未取代的具有6至30个碳原子的芳基团，或取代或未取代的具有4至30个碳原子的一价杂环有机基团。]

  公开号：

  US20110112306A1

文献信息

• PATTERN-FORMING METHOD AND RADIATION-SENSITIVE COMPOSITION
  申请人：JSR CORPORATION

  公开号：US20210181627A1

  公开（公告）日：2021-06-17

  A pattern-forming method includes: applying directly or indirectly on a substrate a radiation-sensitive composition containing a complex and an organic solvent to form a film; exposing the film to an ultraviolet ray, a far ultraviolet ray, an extreme ultraviolet ray, or an electron beam; and developing the film exposed, wherein the complex is represented by formula (1). [M m L n Q p ]  (1) In the formula (1), M represents a zinc atom, a cobalt atom, a nickel atom, a hafnium atom, a zirconium atom, a titanium atom, an iron atom, a chromium atom, a manganese atom, or an indium atom; and L represents a ligand derived from a compound represented by formula (2). R 1 —CHR 3 —R 2 (2) In the formula (2), R 1 and R 2 each independently represent —C(═O)—R A , —C(═O)—OR B , or —CN.

  一种图案形成方法包括：在基板上直接或间接地涂覆含有复合物和有机溶剂的辐射敏感组合物以形成膜；将膜暴露于紫外线、远紫外线、极紫外线或电子束；和显影所暴露的膜，其中该复合物由式（1）表示。[MmLnQp] (1)在式（1）中，M代表锌原子、钴原子、镍原子、铪原子、锆原子、钛原子、铁原子、铬原子、锰原子或铟原子；L代表来自由式（2）表示的化合物的配体。R1—CHR3—R2(2)在式（2）中，R1和R2分别独立地表示—C(═O)—RA、—C(═O)—ORB或—CN。
• RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER AND COMPOUND
  申请人：Nakahara Kazuo

  公开号：US20120082934A1

  公开（公告）日：2012-04-05

  [Problem] To reduce the time required for a film to exhibit decreased hydrophobicity after liquid immersion lithography while allowing the surface of a film to exhibit high hydrophobicity during liquid immersion lithography. [Solution] A radiation-sensitive resin composition including (A) a polymer that includes a repeating unit (a1) and a fluorine atom, and (B) a photoacid generator, the repeating unit (a1) including a group shown by any of the following formulas (1-1) to (1-3).

  [问题] 在液体浸润光刻后，减少薄膜表现出降低的疏水性所需的时间，同时允许薄膜表面在液体浸润光刻期间表现出高疏水性。[解决方案] 包括（A）聚合物和（B）光酸发生剂的辐射敏感树脂组合物，其中重复单元（a1）包括重复单元（a1）和氟原子，并且（a1）包括以下任意一种公式（1-1）至（1-3）所示的基团。
• Radiation-sensitive composition, pattern-forming method and radiation-sensitive acid generating agent
  申请人：JSR CORPORATION

  公开号：US11204552B2

  公开（公告）日：2021-12-21

  A radiation-sensitive composition includes: a first polymer having a first structural unit that includes an acid-labile group; and a first compound including a metal cation and a first anion that is a conjugate base of an acid. The acid has a pKa of no greater than 0. The acid is preferably sulfonic acid, nitric acid, organic azinic acid, disulfonylimidic acid or a combination thereof. The first compound is preferably represented by formula (1). In the formula (1), M represents a metal cation; A represents the first anion; x is an integer of 1 to 6; R1 represents a σ ligand; and y is an integer of 0 to 5, and a sum: x+y is no greater than 6. The van der Waals volume of the acid is preferably no less than 2.5×10−28 m3. [AxMR1y]  (1)

  一种辐射敏感的组合物包括：第一聚合物，具有包括酸敏感基团的第一结构单元;和第一化合物，包括金属阳离子和第一阴离子，该第一阴离子是酸的共轭碱。该酸的pKa不大于0。该酸优选为磺酸，硝酸，有机氮酸，二磺基亚胺酸或其组合物。第一化合物优选由式（1）表示。在式（1）中，M表示金属阳离子; A表示第一阴离子; x为1至6的整数; R1表示σ配体; y为0至5的整数，且总和：x+y不大于6。该酸的范德华体积优选不小于2.5×10−28 m3。[AxMR1y]  (1)
• RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, POLYMER, AND METHOD FOR PRODUCING COMPOUND
  申请人：JSR CORPORATION

  公开号：US20150323866A1

  公开（公告）日：2015-11-12

  A radiation-sensitive resin composition contains: a polymer having a structural unit that includes a group represented by formula (1); a radiation-sensitive acid generator; and an organic solvent. In the formula (1), R P represents a hydrogen atom or a monovalent organic group, and * denotes a binding site to a rest of the structural unit other than the group represented by the formula (1). It is preferred that R P in the formula (1) represents a monovalent organic group, and the monovalent organic group is an acid-nonlabile group. It is also preferred that R P in the formula (1) represents a monovalent organic group, and the monovalent organic group is an acid-labile group.

  一种辐射敏感的树脂组合物包含：具有结构单元的聚合物，该结构单元包括由公式（1）表示的基团；辐射敏感的酸发生剂；和有机溶剂。在公式（1）中，RP表示氢原子或一价有机基团，*表示与公式（1）中表示的基团以外的结构单元的其余部分的结合位点。优选的是，在公式（1）中，RP表示一价有机基团，该一价有机基团是不可酸解的基团。还优选在公式（1）中，RP表示一价有机基团，该一价有机基团是可酸解的基团。
• RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER, COMPOUND, AND METHOD FOR PRODUCING COMPOUND
  申请人：JSR CORPORATION

  公开号：US20140186771A1

  公开（公告）日：2014-07-03

  A radiation-sensitive resin composition includes a polymer that includes a structural unit represented by a formula (1), and an acid generator. R 1 is a hydrogen atom, a fluorine atom, or the like. R 2 is a hydrogen atom or a monovalent hydrocarbon group. R 3 is a hydrogen atom, a monovalent chain hydrocarbon group, or the like. R 4 is a hydrogen atom, a monovalent chain hydrocarbon group, or the like. R 5 is a hydrogen atom, a monovalent chain hydrocarbon group, or the like. R 6 is a monovalent chain hydrocarbon group. R 6 is bonded to R 3 to form a first alicyclic structure, or R 6 is bonded to R 5 to form a second alicyclic structure. At least one hydrogen atom of R 2 , R 3 , or R 4 is optionally substituted with a fluorine atom.

  一种辐射敏感树脂组合物，包括聚合物，该聚合物包括由式（1）表示的结构单元和酸发生剂。其中R1为氢原子、氟原子或类似物。R2为氢原子或一价碳氢基团。R3为氢原子、一价链状碳氢基团或类似物。R4为氢原子、一价链状碳氢基团或类似物。R5为氢原子、一价链状碳氢基团或类似物。R6为一价链状碳氢基团。R6与R3结合形成第一脂环结构，或R6与R5结合形成第二脂环结构。R2、R3或R4中的至少一个氢原子可以被氟原子取代。