Process for group III-V semiconductor nanostructure synthesis and compositions made using same
申请人:NANOSYS, Inc.
公开号:US10266409B1
公开(公告)日:2019-04-23
Methods for producing nanostructures, particularly Group III-V semiconductor nanostructures, are provided. The methods include use of novel Group III and/or Group V precursors, novel surfactants, oxide acceptors, high temperature, and/or stable co-products. Related compositions are also described. Methods and compositions for producing Group III inorganic compounds that can be used as precursors for nanostructure synthesis are provided. Methods for increasing the yield of nanostructures from a synthesis reaction by removal of a vaporous by-product are also described.
提供了生产纳米结构,特别是 III-V 族半导体纳米结构的方法。这些方法包括使用新型 III 族和/或 V 族前体、新型表面活性剂、氧化物受体、高温和/或稳定的副产品。还描述了相关的组合物。提供了生产可用作纳米结构合成前体的 III 族无机化合物的方法和组合物。还介绍了通过去除气相副产物提高合成反应中纳米结构产率的方法。