p-Pivaloyloxybenzenesulfonyl and methylsulfonyl residues were used as linkers to attach secondary alcohols to Wang resin and to Merrifield resin, respectively. p-Pivaloyloxybenzenesulfonates of alcohols were deprotected at the phenolic group and coupled with Wang resin by Mitsunobu reaction whereas mesylates were lithiated at the methyl group and subsequently connected with chloromethyl residues of Merrifield resin.
p-Pivaloyloxybenzenesulfonyl and methylsulfonyl residues were used as linkers to attach secondary alcohols to Wang resin and to Merrifield resin, respectively. p-Pivaloyloxybenzenesulfonates of alcohols were deprotected at the phenolic group and coupled with Wang resin by Mitsunobu reaction whereas mesylates were lithiated at the methyl group and subsequently connected with chloromethyl residues of Merrifield resin.