Disclosed herein is a formulation for depositing a cured underlayer for promoting the formation of self assembled structures. The underlayer comprises: (a) a polymer comprising at least one pendant vinyl ether monomer repeat unit having the structure, (I):
wherein R is chosen from H, C
1
-C
4
alkyl, or halogen, and W is a divalent group chosen from C
1
-C
6
alkylene, C
6
-C
20
arylene, benzylene, or C
2
-C
20
alkyleneoxyalkylene; (ii) optional thermal acid generator; and (c) a solvent. The invention also relates to processes of forming a pattern using the underlayer.
本文公开了一种用于沉积固化底层以促进自组装结构形成的配方。该底层包括:(a)聚合物,包括至少一个带有结构(I)的侧链
乙烯醚单体重复单元,其中R选择自H、C1-C4烷基或卤素,W选择自C1-C6烷基、C6-C20芳基、苯基或C2-C20烷氧基烷基;(ii)可选的热酸发生剂;以及(c)溶剂。本发明还涉及使用该底层形成图案的工艺。